Effect of annealing temperature and rate of sputtering on the magnetic properties and microstructure of the polycrystalline nickel films with (200) texture

The dependences of the magnetic properties and morphology of polycrystalline nickel (Ni) films with the (200) texture that are fabricated using the dc magnetron sputtering on the SiO 2 /Si(100) substrates on sputtering rate annealing temperature T , and film thickness d are analyzed. It is demonstra...

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Veröffentlicht in:Journal of communications technology & electronics 2012-05, Vol.57 (5), p.498-505
Hauptverfasser: Dzhumaliev, A. S., Nikulin, Yu. V., Filimonov, Yu. A.
Format: Artikel
Sprache:eng
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