On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition
How does your graphene grow? In situ X‐ray photoelectron spectroscopy and X‐ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub...
Gespeichert in:
| Veröffentlicht in: | Chemphyschem 2012-07, Vol.13 (10), p.2544-2549 |
|---|---|
| Hauptverfasser: | , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 2549 |
|---|---|
| container_issue | 10 |
| container_start_page | 2544 |
| container_title | Chemphyschem |
| container_volume | 13 |
| creator | Weatherup, Robert S. Bayer, Bernhard C. Blume, Raoul Baehtz, Carsten Kidambi, Piran R. Fouquet, Martin Wirth, Christoph T. Schlögl, Robert Hofmann, Stephan |
| description | How does your graphene grow? In situ X‐ray photoelectron spectroscopy and X‐ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub‐surface dissolved carbon is shown to play an important role. |
| doi_str_mv | 10.1002/cphc.201101020 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1024098423</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1024098423</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4130-f323f95d771ea27843eeee7140831385ebf4328e54cd23759aaf2615ee1cfa223</originalsourceid><addsrcrecordid>eNqFkEtPGzEURq0KVB7ttks0G6RuJvjanvHMEqZpqMQjKrQsLeNca0znhT1Ryb-vo4SUHd7Yi_Ndf_cQ8gXoBChlZ2aozYRRAAqU0Q_kEAQvU5kL2Nu-BePZATkK4YlSWlAJH8kBY1wWeSkPyfS2S8Yak2s0te5caEPS2-TGpZUedbMKuEhmXg81dphUNbbO6Cb5rYd-6ZNvOPTBja7vPpF9q5uAn7f3Mfn1fXpfXaZXt7Mf1flVagRwmlrOuC2zhZSAmslCcIxHgqAFB15k-GgFZwVmwixiw6zU2rIcMkQwVsfSx-TrZu7g--clhlG1LhhsGt1hvwwqOhC0LOLKEZ1sUOP7EDxaNXjXar-KkFqrU2t1aqcuBk62s5ePLS52-KurCJxuAR2iBet1Z1z4z-VQcgbrkuWG--saXL3zrarml9XbEukm68KIL7us9n9ULqMR9XAzUzC_AzF_-Kku-D-lC5Tq</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1024098423</pqid></control><display><type>article</type><title>On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Weatherup, Robert S. ; Bayer, Bernhard C. ; Blume, Raoul ; Baehtz, Carsten ; Kidambi, Piran R. ; Fouquet, Martin ; Wirth, Christoph T. ; Schlögl, Robert ; Hofmann, Stephan</creator><creatorcontrib>Weatherup, Robert S. ; Bayer, Bernhard C. ; Blume, Raoul ; Baehtz, Carsten ; Kidambi, Piran R. ; Fouquet, Martin ; Wirth, Christoph T. ; Schlögl, Robert ; Hofmann, Stephan</creatorcontrib><description>How does your graphene grow? In situ X‐ray photoelectron spectroscopy and X‐ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub‐surface dissolved carbon is shown to play an important role.</description><identifier>ISSN: 1439-4235</identifier><identifier>EISSN: 1439-7641</identifier><identifier>DOI: 10.1002/cphc.201101020</identifier><identifier>PMID: 22378697</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Catalysis ; chemical vapor deposition ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Chemistry ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; General and physical chemistry ; graphene ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; nickel ; photoelectron spectroscopy ; Physics ; Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry ; X-ray diffraction</subject><ispartof>Chemphyschem, 2012-07, Vol.13 (10), p.2544-2549</ispartof><rights>Copyright © 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4130-f323f95d771ea27843eeee7140831385ebf4328e54cd23759aaf2615ee1cfa223</citedby><cites>FETCH-LOGICAL-c4130-f323f95d771ea27843eeee7140831385ebf4328e54cd23759aaf2615ee1cfa223</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fcphc.201101020$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fcphc.201101020$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27903,27904,45553,45554</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26193212$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/22378697$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Weatherup, Robert S.</creatorcontrib><creatorcontrib>Bayer, Bernhard C.</creatorcontrib><creatorcontrib>Blume, Raoul</creatorcontrib><creatorcontrib>Baehtz, Carsten</creatorcontrib><creatorcontrib>Kidambi, Piran R.</creatorcontrib><creatorcontrib>Fouquet, Martin</creatorcontrib><creatorcontrib>Wirth, Christoph T.</creatorcontrib><creatorcontrib>Schlögl, Robert</creatorcontrib><creatorcontrib>Hofmann, Stephan</creatorcontrib><title>On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition</title><title>Chemphyschem</title><addtitle>ChemPhysChem</addtitle><description>How does your graphene grow? In situ X‐ray photoelectron spectroscopy and X‐ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub‐surface dissolved carbon is shown to play an important role.</description><subject>Catalysis</subject><subject>chemical vapor deposition</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Chemistry</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>graphene</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>nickel</subject><subject>photoelectron spectroscopy</subject><subject>Physics</subject><subject>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</subject><subject>X-ray diffraction</subject><issn>1439-4235</issn><issn>1439-7641</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNqFkEtPGzEURq0KVB7ttks0G6RuJvjanvHMEqZpqMQjKrQsLeNca0znhT1Ryb-vo4SUHd7Yi_Ndf_cQ8gXoBChlZ2aozYRRAAqU0Q_kEAQvU5kL2Nu-BePZATkK4YlSWlAJH8kBY1wWeSkPyfS2S8Yak2s0te5caEPS2-TGpZUedbMKuEhmXg81dphUNbbO6Cb5rYd-6ZNvOPTBja7vPpF9q5uAn7f3Mfn1fXpfXaZXt7Mf1flVagRwmlrOuC2zhZSAmslCcIxHgqAFB15k-GgFZwVmwixiw6zU2rIcMkQwVsfSx-TrZu7g--clhlG1LhhsGt1hvwwqOhC0LOLKEZ1sUOP7EDxaNXjXar-KkFqrU2t1aqcuBk62s5ePLS52-KurCJxuAR2iBet1Z1z4z-VQcgbrkuWG--saXL3zrarml9XbEukm68KIL7us9n9ULqMR9XAzUzC_AzF_-Kku-D-lC5Tq</recordid><startdate>20120716</startdate><enddate>20120716</enddate><creator>Weatherup, Robert S.</creator><creator>Bayer, Bernhard C.</creator><creator>Blume, Raoul</creator><creator>Baehtz, Carsten</creator><creator>Kidambi, Piran R.</creator><creator>Fouquet, Martin</creator><creator>Wirth, Christoph T.</creator><creator>Schlögl, Robert</creator><creator>Hofmann, Stephan</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley</general><scope>BSCLL</scope><scope>IQODW</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20120716</creationdate><title>On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition</title><author>Weatherup, Robert S. ; Bayer, Bernhard C. ; Blume, Raoul ; Baehtz, Carsten ; Kidambi, Piran R. ; Fouquet, Martin ; Wirth, Christoph T. ; Schlögl, Robert ; Hofmann, Stephan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4130-f323f95d771ea27843eeee7140831385ebf4328e54cd23759aaf2615ee1cfa223</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Catalysis</topic><topic>chemical vapor deposition</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Chemistry</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>graphene</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>nickel</topic><topic>photoelectron spectroscopy</topic><topic>Physics</topic><topic>Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Weatherup, Robert S.</creatorcontrib><creatorcontrib>Bayer, Bernhard C.</creatorcontrib><creatorcontrib>Blume, Raoul</creatorcontrib><creatorcontrib>Baehtz, Carsten</creatorcontrib><creatorcontrib>Kidambi, Piran R.</creatorcontrib><creatorcontrib>Fouquet, Martin</creatorcontrib><creatorcontrib>Wirth, Christoph T.</creatorcontrib><creatorcontrib>Schlögl, Robert</creatorcontrib><creatorcontrib>Hofmann, Stephan</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Chemphyschem</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Weatherup, Robert S.</au><au>Bayer, Bernhard C.</au><au>Blume, Raoul</au><au>Baehtz, Carsten</au><au>Kidambi, Piran R.</au><au>Fouquet, Martin</au><au>Wirth, Christoph T.</au><au>Schlögl, Robert</au><au>Hofmann, Stephan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition</atitle><jtitle>Chemphyschem</jtitle><addtitle>ChemPhysChem</addtitle><date>2012-07-16</date><risdate>2012</risdate><volume>13</volume><issue>10</issue><spage>2544</spage><epage>2549</epage><pages>2544-2549</pages><issn>1439-4235</issn><eissn>1439-7641</eissn><abstract>How does your graphene grow? In situ X‐ray photoelectron spectroscopy and X‐ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub‐surface dissolved carbon is shown to play an important role.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>22378697</pmid><doi>10.1002/cphc.201101020</doi><tpages>6</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1439-4235 |
| ispartof | Chemphyschem, 2012-07, Vol.13 (10), p.2544-2549 |
| issn | 1439-4235 1439-7641 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1024098423 |
| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Catalysis chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Chemistry Cross-disciplinary physics: materials science rheology Exact sciences and technology General and physical chemistry graphene Materials science Methods of deposition of films and coatings film growth and epitaxy nickel photoelectron spectroscopy Physics Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry X-ray diffraction |
| title | On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T08%3A39%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=On%20the%20Mechanisms%20of%20Ni-Catalysed%20Graphene%20Chemical%20Vapour%20Deposition&rft.jtitle=Chemphyschem&rft.au=Weatherup,%20Robert%20S.&rft.date=2012-07-16&rft.volume=13&rft.issue=10&rft.spage=2544&rft.epage=2549&rft.pages=2544-2549&rft.issn=1439-4235&rft.eissn=1439-7641&rft_id=info:doi/10.1002/cphc.201101020&rft_dat=%3Cproquest_cross%3E1024098423%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1024098423&rft_id=info:pmid/22378697&rfr_iscdi=true |