The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition

To investigate the effect of the gun size on plasma and carbon nitride film deposition characteristics in RF magnetron sputtering system, we performed the RF sputtering deposition with different gun sizes and targets (50.8mm and 76.2mm in diameter). The result shows that there are remarkable differe...

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Veröffentlicht in:Thin solid films 2011-08, Vol.519 (20), p.6649-6653
Hauptverfasser: ROH, Ki-Min, YOU, Shin-Jae, KIM, Dae-Woong, HAN, Jun-Hee, KIM, Jung-Hyung, SEONG, Dae-Jin
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Sprache:eng
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