The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition
To investigate the effect of the gun size on plasma and carbon nitride film deposition characteristics in RF magnetron sputtering system, we performed the RF sputtering deposition with different gun sizes and targets (50.8mm and 76.2mm in diameter). The result shows that there are remarkable differe...
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| Veröffentlicht in: | Thin solid films 2011-08, Vol.519 (20), p.6649-6653 |
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| container_title | Thin solid films |
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| creator | ROH, Ki-Min YOU, Shin-Jae KIM, Dae-Woong HAN, Jun-Hee KIM, Jung-Hyung SEONG, Dae-Jin |
| description | To investigate the effect of the gun size on plasma and carbon nitride film deposition characteristics in RF magnetron sputtering system, we performed the RF sputtering deposition with different gun sizes and targets (50.8mm and 76.2mm in diameter). The result shows that there are remarkable different results between two magnetron sputtering guns: in plasma measurement result, the 50.8mm gun made a column-like discharge from the target to substrate where the deposition takes place, but the 76.2mm gun made a small volume discharge confined nearby the target, in FTIR spectra and hardness test result, the CNx films deposited by the 50.8mm gun contained more sp3 CN bonds, and less hydrogenated bonds and better nano-hardness, compared with those by the 76.2mm gun. This result is ascribed to the fact that the magnetic field configuration evolution, especially the null point difference, with varying gun size can influence the plasma structure and film property changes. |
| doi_str_mv | 10.1016/j.tsf.2011.04.089 |
| format | Article |
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The result shows that there are remarkable different results between two magnetron sputtering guns: in plasma measurement result, the 50.8mm gun made a column-like discharge from the target to substrate where the deposition takes place, but the 76.2mm gun made a small volume discharge confined nearby the target, in FTIR spectra and hardness test result, the CNx films deposited by the 50.8mm gun contained more sp3 CN bonds, and less hydrogenated bonds and better nano-hardness, compared with those by the 76.2mm gun. This result is ascribed to the fact that the magnetic field configuration evolution, especially the null point difference, with varying gun size can influence the plasma structure and film property changes.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2011.04.089</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Deposition by sputtering ; Discharge ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Evolution ; Exact sciences and technology ; Fullerenes and related materials; diamonds, graphite ; Magnetron sputtering ; Materials science ; Mechanical and acoustical properties ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanocomposites ; Nanostructure ; Physical properties of thin films, nonelectronic ; Physics ; Radio frequencies ; Specific materials ; Spectra ; Surface and interface electron states ; Surface states, band structure, electron density of states ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Thin solid films, 2011-08, Vol.519 (20), p.6649-6653</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c308t-e7376f0ccbc299f70744df24437206ae27067d762a1157113c5c613679a854173</citedby><cites>FETCH-LOGICAL-c308t-e7376f0ccbc299f70744df24437206ae27067d762a1157113c5c613679a854173</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24493247$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>ROH, Ki-Min</creatorcontrib><creatorcontrib>YOU, Shin-Jae</creatorcontrib><creatorcontrib>KIM, Dae-Woong</creatorcontrib><creatorcontrib>HAN, Jun-Hee</creatorcontrib><creatorcontrib>KIM, Jung-Hyung</creatorcontrib><creatorcontrib>SEONG, Dae-Jin</creatorcontrib><title>The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition</title><title>Thin solid films</title><description>To investigate the effect of the gun size on plasma and carbon nitride film deposition characteristics in RF magnetron sputtering system, we performed the RF sputtering deposition with different gun sizes and targets (50.8mm and 76.2mm in diameter). The result shows that there are remarkable different results between two magnetron sputtering guns: in plasma measurement result, the 50.8mm gun made a column-like discharge from the target to substrate where the deposition takes place, but the 76.2mm gun made a small volume discharge confined nearby the target, in FTIR spectra and hardness test result, the CNx films deposited by the 50.8mm gun contained more sp3 CN bonds, and less hydrogenated bonds and better nano-hardness, compared with those by the 76.2mm gun. This result is ascribed to the fact that the magnetic field configuration evolution, especially the null point difference, with varying gun size can influence the plasma structure and film property changes.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Deposition by sputtering</subject><subject>Discharge</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Evolution</subject><subject>Exact sciences and technology</subject><subject>Fullerenes and related materials; diamonds, graphite</subject><subject>Magnetron sputtering</subject><subject>Materials science</subject><subject>Mechanical and acoustical properties</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanocomposites</subject><subject>Nanostructure</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Radio frequencies</subject><subject>Specific materials</subject><subject>Spectra</subject><subject>Surface and interface electron states</subject><subject>Surface states, band structure, electron density of states</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNo9kEtPwzAQhC0EEqXwA7j5gsQlYf1InBxRxUuq4FLOlnHs1lVe2I4E_HoctXBaze7MaPUhdE0gJ0DKu30eg80pEJIDz6GqT9CCVKLOqGDkFC0AOGQl1HCOLkLYAwChlC1Qu9kZbKw1OuLB4phUp7a9iX7ocRinGI13_RZvpyTdj8FpPZv0Tnml52OIToe_7Niq0Cms-gavXr-wdW2HGzMOwUU39JfozKo2mKvjXKL3x4fN6jlbvz29rO7XmWZQxcwIJkoLWn9oWtdWgOC8sZRzJiiUylABpWhESRUhhSCE6UKXhJWiVlXBiWBLdHvoHf3wOZkQZeeCNm2rejNMQRKgtKoKUc1WcrBqP4TgjZWjd53y38kkZ7JyLxNZOZOVwGUimzI3x3oVtGqtV7124T-YHq0Z5YL9AmN3eW0</recordid><startdate>20110801</startdate><enddate>20110801</enddate><creator>ROH, Ki-Min</creator><creator>YOU, Shin-Jae</creator><creator>KIM, Dae-Woong</creator><creator>HAN, Jun-Hee</creator><creator>KIM, Jung-Hyung</creator><creator>SEONG, Dae-Jin</creator><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20110801</creationdate><title>The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition</title><author>ROH, Ki-Min ; YOU, Shin-Jae ; KIM, Dae-Woong ; HAN, Jun-Hee ; KIM, Jung-Hyung ; SEONG, Dae-Jin</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c308t-e7376f0ccbc299f70744df24437206ae27067d762a1157113c5c613679a854173</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Deposition by sputtering</topic><topic>Discharge</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Evolution</topic><topic>Exact sciences and technology</topic><topic>Fullerenes and related materials; diamonds, graphite</topic><topic>Magnetron sputtering</topic><topic>Materials science</topic><topic>Mechanical and acoustical properties</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Nanocomposites</topic><topic>Nanostructure</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Radio frequencies</topic><topic>Specific materials</topic><topic>Spectra</topic><topic>Surface and interface electron states</topic><topic>Surface states, band structure, electron density of states</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ROH, Ki-Min</creatorcontrib><creatorcontrib>YOU, Shin-Jae</creatorcontrib><creatorcontrib>KIM, Dae-Woong</creatorcontrib><creatorcontrib>HAN, Jun-Hee</creatorcontrib><creatorcontrib>KIM, Jung-Hyung</creatorcontrib><creatorcontrib>SEONG, Dae-Jin</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ROH, Ki-Min</au><au>YOU, Shin-Jae</au><au>KIM, Dae-Woong</au><au>HAN, Jun-Hee</au><au>KIM, Jung-Hyung</au><au>SEONG, Dae-Jin</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition</atitle><jtitle>Thin solid films</jtitle><date>2011-08-01</date><risdate>2011</risdate><volume>519</volume><issue>20</issue><spage>6649</spage><epage>6653</epage><pages>6649-6653</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>To investigate the effect of the gun size on plasma and carbon nitride film deposition characteristics in RF magnetron sputtering system, we performed the RF sputtering deposition with different gun sizes and targets (50.8mm and 76.2mm in diameter). The result shows that there are remarkable different results between two magnetron sputtering guns: in plasma measurement result, the 50.8mm gun made a column-like discharge from the target to substrate where the deposition takes place, but the 76.2mm gun made a small volume discharge confined nearby the target, in FTIR spectra and hardness test result, the CNx films deposited by the 50.8mm gun contained more sp3 CN bonds, and less hydrogenated bonds and better nano-hardness, compared with those by the 76.2mm gun. This result is ascribed to the fact that the magnetic field configuration evolution, especially the null point difference, with varying gun size can influence the plasma structure and film property changes.</abstract><cop>Amsterdam</cop><pub>Elsevier</pub><doi>10.1016/j.tsf.2011.04.089</doi><tpages>5</tpages></addata></record> |
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| subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Deposition by sputtering Discharge Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Evolution Exact sciences and technology Fullerenes and related materials diamonds, graphite Magnetron sputtering Materials science Mechanical and acoustical properties Methods of deposition of films and coatings film growth and epitaxy Nanocomposites Nanostructure Physical properties of thin films, nonelectronic Physics Radio frequencies Specific materials Spectra Surface and interface electron states Surface states, band structure, electron density of states Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | The effect of the magnetron sputtering gun size on the characteristics of the plasma and CNx film deposition |
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