Determination of the Dill parameters of thick positive resist for use in modeling applications

The determination of Dill parameters of thick resist is very important to improve simulation models of resist exposure and real world processes. A new extraction technique of Dill parameters based on spectroscopic ellipsometry in combination with an advanced resist exposure model is proposed for thi...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Thin solid films 2011-02, Vol.519 (9), p.2978-2984
Hauptverfasser:	Roeder, G., Liu, S., Aygun, G., Evanschitzky, P., Erdmann, A., Schellenberger, M., Pfitzner, L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Computer simulation Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Dill parameters Ellipsometry Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mathematical models Optical instruments, equipment and techniques Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Polarimeters and ellipsometers Refractivity Resists Simulation Spectroscopic analysis Spectroscopic ellipsometry Spectroscopy Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thick resist Thin film structure and morphology
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!