Influence of Ag thickness on electrical, optical and structural properties of nanocrystalline MoO3/Ag/ITO multilayer for optoelectronic applications

In this study, MoO3/Ag/ITO/glass (MAI) nano-multilayer films were deposited by the thermal evaporation technique and then were annealed in air atmosphere at 200 °C for 1 h. The effects of Ag layer thickness on electrical, optical and structural properties of the MoO3(45 nm)/Ag(5–20 nm)/ITO(45 nm)/gl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Vacuum 2012-03, Vol.86 (9), p.1318-1322
Hauptverfasser:	Ghasemi Varnamkhasti, Mohsen, Fallah, Hamid Reza, Mostajaboddavati, Mojtaba, Hassanzadeh, Ali
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Glass Indium tin oxide MoO3/Ag/ITO/glass multilayer films Multilayers Nanomaterials Nanostructure Optical properties Silver Transparent conductive anode X-ray diffraction
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!