Optical and Physical Characterization of SRSO and SRSN Gradient Thin Films
Silicon rich silicon nitride （SRSN） and silicon rich silicon oxide （SRSO） thin films were deposited by gradually varying nitrogen or oxygen concentrations, in order to achieve a variable composition along the film thickness. Post-deposition, films were thermally annealed in a quartz tube furnace und...
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| Veröffentlicht in: | Journal of materials science and engineering. A 2011-07, Vol.1 (2), p.152-160 |
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| container_title | Journal of materials science and engineering. A |
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| creator | Donzella, V Wilson, PRJ Dunn, KA Wojcik, J Mascher, P |
| description | Silicon rich silicon nitride （SRSN） and silicon rich silicon oxide （SRSO） thin films were deposited by gradually varying nitrogen or oxygen concentrations, in order to achieve a variable composition along the film thickness. Post-deposition, films were thermally annealed in a quartz tube furnace under several annealing conditions. The optical and structural properties of the annealed films were characterized through photoluminescence （PL） measurements and transmission electron microscopy （TEM） analysis. Annealing strongly influenced the PL spectra of the films, showing features originating either from defects or in other cases, from the formation of silicon nanostructures. |
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Annealing strongly influenced the PL spectra of the films, showing features originating either from defects or in other cases, from the formation of silicon nanostructures.</description><subject>Annealing</subject><subject>Concentration (composition)</subject><subject>Defect annealing</subject><subject>Materials science</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Silicon</subject><subject>Thin films</subject><subject>光学</subject><subject>梯度薄膜</subject><subject>氧化硅</subject><subject>物理特性</subject><subject>硅纳米结构</subject><subject>薄膜沉积</subject><subject>退火条件</subject><subject>透射电子显微镜</subject><issn>2161-6213</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNotzL1qwzAUBWAPLTSkeQd162LQj2VLYzFN2hLq0ng3V_J1LLDlRHKG9OkbkkznHPg4D8mCs5ylOWfiKVnF6AxlLJMsE2qRfFWH2VkYCPiW_PTneB1lDwHsjMH9wewmT6aO7H531VVdyjfZBGgd-pnUvfNk7YYxPiePHQwRV_dcJvX6vS4_0m21-SzftqmVukgRAQ3LDQLPsEWtuVbWijYvDM1txxkaSo3smDCMFloaA9BJyCQ3GSohxDJ5vd0ewnQ8YZyb0UWLwwAep1NsGOVcZVoVxYW-3KjtJ78_Or9vDsGNEM6NUJpLmmvxDwCEVTw</recordid><startdate>20110701</startdate><enddate>20110701</enddate><creator>Donzella, V</creator><creator>Wilson, PRJ</creator><creator>Dunn, KA</creator><creator>Wojcik, J</creator><creator>Mascher, P</creator><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W92</scope><scope>~WA</scope><scope>7QQ</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20110701</creationdate><title>Optical and Physical Characterization of SRSO and SRSN Gradient Thin Films</title><author>Donzella, V ; Wilson, PRJ ; Dunn, KA ; Wojcik, J ; Mascher, P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c597-eeaeb16bea24ede99298cc3d67b06cf21eb00b5f13b10795bbaaf5a452b4e8333</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>Annealing</topic><topic>Concentration (composition)</topic><topic>Defect annealing</topic><topic>Materials science</topic><topic>Nanomaterials</topic><topic>Nanostructure</topic><topic>Silicon</topic><topic>Thin films</topic><topic>光学</topic><topic>梯度薄膜</topic><topic>氧化硅</topic><topic>物理特性</topic><topic>硅纳米结构</topic><topic>薄膜沉积</topic><topic>退火条件</topic><topic>透射电子显微镜</topic><toplevel>online_resources</toplevel><creatorcontrib>Donzella, V</creatorcontrib><creatorcontrib>Wilson, PRJ</creatorcontrib><creatorcontrib>Dunn, KA</creatorcontrib><creatorcontrib>Wojcik, J</creatorcontrib><creatorcontrib>Mascher, P</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-工程技术</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of materials science and engineering. A</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Donzella, V</au><au>Wilson, PRJ</au><au>Dunn, KA</au><au>Wojcik, J</au><au>Mascher, P</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Optical and Physical Characterization of SRSO and SRSN Gradient Thin Films</atitle><jtitle>Journal of materials science and engineering. A</jtitle><addtitle>Journal of Materials Science and Engineering A</addtitle><date>2011-07-01</date><risdate>2011</risdate><volume>1</volume><issue>2</issue><spage>152</spage><epage>160</epage><pages>152-160</pages><issn>2161-6213</issn><abstract>Silicon rich silicon nitride （SRSN） and silicon rich silicon oxide （SRSO） thin films were deposited by gradually varying nitrogen or oxygen concentrations, in order to achieve a variable composition along the film thickness. Post-deposition, films were thermally annealed in a quartz tube furnace under several annealing conditions. The optical and structural properties of the annealed films were characterized through photoluminescence （PL） measurements and transmission electron microscopy （TEM） analysis. Annealing strongly influenced the PL spectra of the films, showing features originating either from defects or in other cases, from the formation of silicon nanostructures.</abstract><tpages>9</tpages></addata></record> |
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| identifier | ISSN: 2161-6213 |
| ispartof | Journal of materials science and engineering. A, 2011-07, Vol.1 (2), p.152-160 |
| issn | 2161-6213 |
| language | chi ; eng |
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| source | Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals |
| subjects | Annealing Concentration (composition) Defect annealing Materials science Nanomaterials Nanostructure Silicon Thin films 光学 梯度薄膜 氧化硅 物理特性 硅纳米结构 薄膜沉积 退火条件 透射电子显微镜 |
| title | Optical and Physical Characterization of SRSO and SRSN Gradient Thin Films |
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