Particle Collecting in a 13.56-MHz Radio-Frequency Methane Discharge
Radio-frequency methane plasmas are widely used for deposition of amorphous hydrogenated coatings a-C:H in PECVD reactors. According to our experimental conditions, particles are also generated in the plasma. The study of the chemical nature of these particles requires a sufficient quantity to be co...
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| Veröffentlicht in: | IEEE transactions on plasma science 2011-11, Vol.39 (11), p.2756-2757 |
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| container_title | IEEE transactions on plasma science |
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| creator | Massereau-Guilbaud, V. Geraud-Grenier, I. Plain, A. |
| description | Radio-frequency methane plasmas are widely used for deposition of amorphous hydrogenated coatings a-C:H in PECVD reactors. According to our experimental conditions, particles are also generated in the plasma. The study of the chemical nature of these particles requires a sufficient quantity to be collected at the end of the experiment. We show that a modification of the electrical field lines above the grounded electrode improves particle collecting. |
| doi_str_mv | 10.1109/TPS.2011.2159026 |
| format | Article |
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We show that a modification of the electrical field lines above the grounded electrode improves particle collecting.</description><subject>Chemical vapor deposition</subject><subject>Coatings</subject><subject>Deposition</subject><subject>Discharge</subject><subject>Discharges</subject><subject>Drag</subject><subject>Dusty plasma</subject><subject>Electric fields</subject><subject>Electrodes</subject><subject>Inductors</subject><subject>Methane</subject><subject>nuclear and plasma sciences</subject><subject>Optical switches</subject><subject>Particle physics</subject><subject>Plasmas</subject><subject>Radio frequency</subject><subject>Radio frequency plasma</subject><subject>Reactors</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkDFPwzAQRi0EEqWwI7FETCwJvjiO7RG1lCK1ooIyW05yblOlSbHTofx6XBUxMN3y7tPTI-QWaAJA1eNy8ZGkFCBJgSua5mdkAIqpWDHBz8mAUsViJoFdkivvN5RCxmk6IOOFcX1dNhiNuqbBsq_bVVS3kYmAJTyP59Pv6N1UdRdPHH7tsS0P0Rz7tWkxGte-XBu3wmtyYU3j8eb3Dsnn5Hk5msazt5fX0dMsLhnIPhYMRGEsY5ngnFepKACMzKwQRWWVhNRikaMp04pnBkVWUCiyrBA8EzS3VrEheTjt7lwXXHyvt0EBmybYdHuvgQKVUqqcB_T-H7rp9q4NdlpRrmTOJAsQPUGl67x3aPXO1VvjDmFJH6vqUFUfq-rfquHl7vRSI-IfzkNlyjn7AYvlcD8</recordid><startdate>201111</startdate><enddate>201111</enddate><creator>Massereau-Guilbaud, V.</creator><creator>Geraud-Grenier, I.</creator><creator>Plain, A.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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| ispartof | IEEE transactions on plasma science, 2011-11, Vol.39 (11), p.2756-2757 |
| issn | 0093-3813 1939-9375 |
| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Chemical vapor deposition Coatings Deposition Discharge Discharges Drag Dusty plasma Electric fields Electrodes Inductors Methane nuclear and plasma sciences Optical switches Particle physics Plasmas Radio frequency Radio frequency plasma Reactors |
| title | Particle Collecting in a 13.56-MHz Radio-Frequency Methane Discharge |
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