Statistical modeling of radiation-induced proton transport in silicon: deactivation of dopant acceptors in bipolar devices

We show that radiation-induced dopant deactivation in MOS capacitors that simulate the base oxides of silicon bipolar transistors is due primarily to direct neutralization by protons. The strong dependence of the deactivation process on electric field is related to the transport of H/sup +/ in the d...

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Veröffentlicht in:IEEE transactions on nuclear science 2003-12, Vol.50 (6), p.1896-1900
Hauptverfasser: Rashkeev, S.N., Fleetwood, D.M., Schrimpf, R.D., Pantelides, S.T.
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Sprache:eng
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