In situ sputtering growth and characterization of MgB2 films for microwave applications
The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.
Gespeichert in:
Veröffentlicht in: | IEEE transactions on applied superconductivity 2003-06, Vol.13 (2), p.3602-3605 |
---|---|
Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 3605 |
---|---|
container_issue | 2 |
container_start_page | 3602 |
container_title | IEEE transactions on applied superconductivity |
container_volume | 13 |
creator | ANDREONE, Antonello CASSINESE, Antonio CHIARELLA, Fabio DI CAPUA, Roberto DI GENNARO, Emiliano LAMURA, Gianrico MAGLIONE, Maria Grazia SALLUZZO, Marco VAGLIO, Ruggero |
description | The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements. |
doi_str_mv | 10.1109/TASC.2003.812408 |
format | Article |
fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_proquest_journals_921507096</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2586883491</sourcerecordid><originalsourceid>FETCH-LOGICAL-p210t-69ca6b8ccd1bd8e40c56a1384e56c3a2486d1d106b843f483ab979beb3ec1b463</originalsourceid><addsrcrecordid>eNotzc9LwzAUB_AgCs7p3WMQPHbm5UeXHudwOph4cOKxvKbpltG1NUkV_evtdKfv48uH9yXkGtgEgGV369nrfMIZExMNXDJ9QkaglE64AnU63ExBojkX5-QihB1jILVUI_K-bGhwsaeh62O03jUbuvHtV9xSbEpqtujRHPofjK5taFvR5809p5Wr94FWrad7ZwaPn5Zi19XO_LlwSc4qrIO9OuaYvC0e1vOnZPXyuJzPVknHgcUkzQymhTamhKLUVjKjUgShpVWpEcilTksogQ1GikpqgUU2zQpbCGugkKkYk5v_v51vP3obYr5re98Mk3nGQbEpyw7o9ogwGKwrj41xIe-826P_zg9sWMrEL69ZYRo</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>921507096</pqid></control><display><type>article</type><title>In situ sputtering growth and characterization of MgB2 films for microwave applications</title><source>IEEE Electronic Library (IEL)</source><creator>ANDREONE, Antonello ; CASSINESE, Antonio ; CHIARELLA, Fabio ; DI CAPUA, Roberto ; DI GENNARO, Emiliano ; LAMURA, Gianrico ; MAGLIONE, Maria Grazia ; SALLUZZO, Marco ; VAGLIO, Ruggero</creator><creatorcontrib>ANDREONE, Antonello ; CASSINESE, Antonio ; CHIARELLA, Fabio ; DI CAPUA, Roberto ; DI GENNARO, Emiliano ; LAMURA, Gianrico ; MAGLIONE, Maria Grazia ; SALLUZZO, Marco ; VAGLIO, Ruggero</creatorcontrib><description>The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.</description><identifier>ISSN: 1051-8223</identifier><identifier>EISSN: 1558-2515</identifier><identifier>DOI: 10.1109/TASC.2003.812408</identifier><language>eng</language><publisher>New York, NY: Institute of Electrical and Electronics Engineers</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Electronics ; Exact sciences and technology ; High-tc films ; Microelectronic fabrication (materials and surfaces technology) ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Superconducting films and low-dimensional structures ; Superconductivity</subject><ispartof>IEEE transactions on applied superconductivity, 2003-06, Vol.13 (2), p.3602-3605</ispartof><rights>2003 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2003</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=15072489$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>ANDREONE, Antonello</creatorcontrib><creatorcontrib>CASSINESE, Antonio</creatorcontrib><creatorcontrib>CHIARELLA, Fabio</creatorcontrib><creatorcontrib>DI CAPUA, Roberto</creatorcontrib><creatorcontrib>DI GENNARO, Emiliano</creatorcontrib><creatorcontrib>LAMURA, Gianrico</creatorcontrib><creatorcontrib>MAGLIONE, Maria Grazia</creatorcontrib><creatorcontrib>SALLUZZO, Marco</creatorcontrib><creatorcontrib>VAGLIO, Ruggero</creatorcontrib><title>In situ sputtering growth and characterization of MgB2 films for microwave applications</title><title>IEEE transactions on applied superconductivity</title><description>The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>High-tc films</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Superconducting films and low-dimensional structures</subject><subject>Superconductivity</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNotzc9LwzAUB_AgCs7p3WMQPHbm5UeXHudwOph4cOKxvKbpltG1NUkV_evtdKfv48uH9yXkGtgEgGV369nrfMIZExMNXDJ9QkaglE64AnU63ExBojkX5-QihB1jILVUI_K-bGhwsaeh62O03jUbuvHtV9xSbEpqtujRHPofjK5taFvR5809p5Wr94FWrad7ZwaPn5Zi19XO_LlwSc4qrIO9OuaYvC0e1vOnZPXyuJzPVknHgcUkzQymhTamhKLUVjKjUgShpVWpEcilTksogQ1GikpqgUU2zQpbCGugkKkYk5v_v51vP3obYr5re98Mk3nGQbEpyw7o9ogwGKwrj41xIe-826P_zg9sWMrEL69ZYRo</recordid><startdate>20030601</startdate><enddate>20030601</enddate><creator>ANDREONE, Antonello</creator><creator>CASSINESE, Antonio</creator><creator>CHIARELLA, Fabio</creator><creator>DI CAPUA, Roberto</creator><creator>DI GENNARO, Emiliano</creator><creator>LAMURA, Gianrico</creator><creator>MAGLIONE, Maria Grazia</creator><creator>SALLUZZO, Marco</creator><creator>VAGLIO, Ruggero</creator><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>IQODW</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20030601</creationdate><title>In situ sputtering growth and characterization of MgB2 films for microwave applications</title><author>ANDREONE, Antonello ; CASSINESE, Antonio ; CHIARELLA, Fabio ; DI CAPUA, Roberto ; DI GENNARO, Emiliano ; LAMURA, Gianrico ; MAGLIONE, Maria Grazia ; SALLUZZO, Marco ; VAGLIO, Ruggero</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p210t-69ca6b8ccd1bd8e40c56a1384e56c3a2486d1d106b843f483ab979beb3ec1b463</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>High-tc films</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Superconducting films and low-dimensional structures</topic><topic>Superconductivity</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ANDREONE, Antonello</creatorcontrib><creatorcontrib>CASSINESE, Antonio</creatorcontrib><creatorcontrib>CHIARELLA, Fabio</creatorcontrib><creatorcontrib>DI CAPUA, Roberto</creatorcontrib><creatorcontrib>DI GENNARO, Emiliano</creatorcontrib><creatorcontrib>LAMURA, Gianrico</creatorcontrib><creatorcontrib>MAGLIONE, Maria Grazia</creatorcontrib><creatorcontrib>SALLUZZO, Marco</creatorcontrib><creatorcontrib>VAGLIO, Ruggero</creatorcontrib><collection>Pascal-Francis</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ANDREONE, Antonello</au><au>CASSINESE, Antonio</au><au>CHIARELLA, Fabio</au><au>DI CAPUA, Roberto</au><au>DI GENNARO, Emiliano</au><au>LAMURA, Gianrico</au><au>MAGLIONE, Maria Grazia</au><au>SALLUZZO, Marco</au><au>VAGLIO, Ruggero</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>In situ sputtering growth and characterization of MgB2 films for microwave applications</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><date>2003-06-01</date><risdate>2003</risdate><volume>13</volume><issue>2</issue><spage>3602</spage><epage>3605</epage><pages>3602-3605</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><abstract>The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.</abstract><cop>New York, NY</cop><pub>Institute of Electrical and Electronics Engineers</pub><doi>10.1109/TASC.2003.812408</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1051-8223 |
ispartof | IEEE transactions on applied superconductivity, 2003-06, Vol.13 (2), p.3602-3605 |
issn | 1051-8223 1558-2515 |
language | eng |
recordid | cdi_proquest_journals_921507096 |
source | IEEE Electronic Library (IEL) |
subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Electronics Exact sciences and technology High-tc films Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Superconducting films and low-dimensional structures Superconductivity |
title | In situ sputtering growth and characterization of MgB2 films for microwave applications |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T22%3A47%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=In%20situ%20sputtering%20growth%20and%20characterization%20of%20MgB2%20films%20for%20microwave%20applications&rft.jtitle=IEEE%20transactions%20on%20applied%20superconductivity&rft.au=ANDREONE,%20Antonello&rft.date=2003-06-01&rft.volume=13&rft.issue=2&rft.spage=3602&rft.epage=3605&rft.pages=3602-3605&rft.issn=1051-8223&rft.eissn=1558-2515&rft_id=info:doi/10.1109/TASC.2003.812408&rft_dat=%3Cproquest_pasca%3E2586883491%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=921507096&rft_id=info:pmid/&rfr_iscdi=true |