In situ sputtering growth and characterization of MgB2 films for microwave applications

The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.

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Veröffentlicht in:IEEE transactions on applied superconductivity 2003-06, Vol.13 (2), p.3602-3605
Hauptverfasser: ANDREONE, Antonello, CASSINESE, Antonio, CHIARELLA, Fabio, DI CAPUA, Roberto, DI GENNARO, Emiliano, LAMURA, Gianrico, MAGLIONE, Maria Grazia, SALLUZZO, Marco, VAGLIO, Ruggero
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container_title IEEE transactions on applied superconductivity
container_volume 13
creator ANDREONE, Antonello
CASSINESE, Antonio
CHIARELLA, Fabio
DI CAPUA, Roberto
DI GENNARO, Emiliano
LAMURA, Gianrico
MAGLIONE, Maria Grazia
SALLUZZO, Marco
VAGLIO, Ruggero
description The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.
doi_str_mv 10.1109/TASC.2003.812408
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subjects Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electronics
Exact sciences and technology
High-tc films
Microelectronic fabrication (materials and surfaces technology)
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Superconducting films and low-dimensional structures
Superconductivity
title In situ sputtering growth and characterization of MgB2 films for microwave applications
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