In situ sputtering growth and characterization of MgB2 films for microwave applications

The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.

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Bibliographische Detailangaben
Veröffentlicht in:	IEEE transactions on applied superconductivity 2003-06, Vol.13 (2), p.3602-3605
Hauptverfasser:	ANDREONE, Antonello, CASSINESE, Antonio, CHIARELLA, Fabio, DI CAPUA, Roberto, DI GENNARO, Emiliano, LAMURA, Gianrico, MAGLIONE, Maria Grazia, SALLUZZO, Marco, VAGLIO, Ruggero
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Electronics Exact sciences and technology High-tc films Microelectronic fabrication (materials and surfaces technology) Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Superconducting films and low-dimensional structures Superconductivity
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Beschreibung
Zusammenfassung:	The films were characterized by a variety of structural and electronic techniques including profilometry, XRD, EDS, and STM-AFM analyses, critical current, upper critical field and penetration depth measurements.
ISSN:	1051-8223 1558-2515
DOI:	10.1109/TASC.2003.812408