A Method to Recover Defective Aluminum Interconnect Films in Mass Production
In mass manufacturing, the quality of aluminum interconnect films could be compromised due to various reasons. Such a compromise could result in electrical shorts and hence failure to yield at the end of the line or, worse, could result in reliability failure such as electromigration if the film mor...
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Veröffentlicht in: | IEEE transactions on semiconductor manufacturing 2007-11, Vol.20 (4), p.482-487 |
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creator | Chew, P. Yeap, C.B. Cham, J. Goh, A. Rossi, N. Singh, R. Ong, K. Toh, H.T. |
description | In mass manufacturing, the quality of aluminum interconnect films could be compromised due to various reasons. Such a compromise could result in electrical shorts and hence failure to yield at the end of the line or, worse, could result in reliability failure such as electromigration if the film morphology or linewidth is affected. As a result of such potential failures, wafers with these types of problems are usually scrapped at the point of detection inline. Scrapping wafers in the line or, worse, at the end of the line, results in financial loss as well as potential delivery problems to customers if there are no backup wafers in the vicinity of the affected step to replace the scrapped wafers. Missing timely delivery to a customer may impact not only the immediate customer but also the customer's customers who may be dependent upon uninterrupted and timely supply in their lean supply chain management system. This paper describes a study done that demonstrated the successful recovery of such problematic wafers along with verification by inline and end of line testing, including device functionality and reliability verification. This feasibility opens the door to avoid potentially huge losses and undesirable delivery impact to multiple stakeholders in the supply chain where time to market is important. |
doi_str_mv | 10.1109/TSM.2007.907620 |
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Such a compromise could result in electrical shorts and hence failure to yield at the end of the line or, worse, could result in reliability failure such as electromigration if the film morphology or linewidth is affected. As a result of such potential failures, wafers with these types of problems are usually scrapped at the point of detection inline. Scrapping wafers in the line or, worse, at the end of the line, results in financial loss as well as potential delivery problems to customers if there are no backup wafers in the vicinity of the affected step to replace the scrapped wafers. Missing timely delivery to a customer may impact not only the immediate customer but also the customer's customers who may be dependent upon uninterrupted and timely supply in their lean supply chain management system. This paper describes a study done that demonstrated the successful recovery of such problematic wafers along with verification by inline and end of line testing, including device functionality and reliability verification. This feasibility opens the door to avoid potentially huge losses and undesirable delivery impact to multiple stakeholders in the supply chain where time to market is important.</description><identifier>ISSN: 0894-6507</identifier><identifier>EISSN: 1558-2345</identifier><identifier>DOI: 10.1109/TSM.2007.907620</identifier><identifier>CODEN: ITSMED</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Aluminum ; Applied sciences ; clean surface ; controlled removal ; Customers ; Design. Technologies. Operation analysis. Testing ; Electric potential ; Electromigration ; Electronics ; Exact sciences and technology ; Failure ; Integrated circuits ; linewidth ; Manufacturing ; Markets ; Mass production ; Morphology ; particle sources ; Potential well ; scrapped wafers ; selectivity ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Semiconductors ; shorts ; successful recovery ; Supply chain management ; Supply chains ; Testing ; Time to market ; Wafers</subject><ispartof>IEEE transactions on semiconductor manufacturing, 2007-11, Vol.20 (4), p.482-487</ispartof><rights>2007 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2007</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c413t-5193a20098a09a8325ca368daaad5cc1f8bb74561fe4f8b3e3558c894ede6b693</citedby><cites>FETCH-LOGICAL-c413t-5193a20098a09a8325ca368daaad5cc1f8bb74561fe4f8b3e3558c894ede6b693</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4369328$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4369328$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19240457$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Chew, P.</creatorcontrib><creatorcontrib>Yeap, C.B.</creatorcontrib><creatorcontrib>Cham, J.</creatorcontrib><creatorcontrib>Goh, A.</creatorcontrib><creatorcontrib>Rossi, N.</creatorcontrib><creatorcontrib>Singh, R.</creatorcontrib><creatorcontrib>Ong, K.</creatorcontrib><creatorcontrib>Toh, H.T.</creatorcontrib><title>A Method to Recover Defective Aluminum Interconnect Films in Mass Production</title><title>IEEE transactions on semiconductor manufacturing</title><addtitle>TSM</addtitle><description>In mass manufacturing, the quality of aluminum interconnect films could be compromised due to various reasons. Such a compromise could result in electrical shorts and hence failure to yield at the end of the line or, worse, could result in reliability failure such as electromigration if the film morphology or linewidth is affected. As a result of such potential failures, wafers with these types of problems are usually scrapped at the point of detection inline. Scrapping wafers in the line or, worse, at the end of the line, results in financial loss as well as potential delivery problems to customers if there are no backup wafers in the vicinity of the affected step to replace the scrapped wafers. Missing timely delivery to a customer may impact not only the immediate customer but also the customer's customers who may be dependent upon uninterrupted and timely supply in their lean supply chain management system. This paper describes a study done that demonstrated the successful recovery of such problematic wafers along with verification by inline and end of line testing, including device functionality and reliability verification. This feasibility opens the door to avoid potentially huge losses and undesirable delivery impact to multiple stakeholders in the supply chain where time to market is important.</description><subject>Aluminum</subject><subject>Applied sciences</subject><subject>clean surface</subject><subject>controlled removal</subject><subject>Customers</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>Electric potential</subject><subject>Electromigration</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Failure</subject><subject>Integrated circuits</subject><subject>linewidth</subject><subject>Manufacturing</subject><subject>Markets</subject><subject>Mass production</subject><subject>Morphology</subject><subject>particle sources</subject><subject>Potential well</subject><subject>scrapped wafers</subject><subject>selectivity</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Semiconductors</subject><subject>shorts</subject><subject>successful recovery</subject><subject>Supply chain management</subject><subject>Supply chains</subject><subject>Testing</subject><subject>Time to market</subject><subject>Wafers</subject><issn>0894-6507</issn><issn>1558-2345</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqFkc1rFEEQxRtRcI2ePXhpBPU0m-rP6T4u0WhglwSN56a3pwYnzHTH7plA_nt73aCQg56qoH5V9R6PkNcM1oyBPb3-tltzgHZtodUcnpAVU8o0XEj1lKzAWNloBe1z8qKUGwAmpW1XZLuhO5x_pI7OiX7FkO4w04_YY5iHO6SbcZmGuEz0Is6YQ4qxDuj5ME6FDpHufCn0KqduqXiKL8mz3o8FXz3UE_L9_NP12Zdme_n54myzbYJkYm4Us8JXqdZ4sN4IroIX2nTe-06FwHqz37dSadajrL1AUY2EagA71HttxQn5cLx7m9PPBcvspqEEHEcfMS3FWRBaADf_J40BrZlkppLv_0kKKSWAaSv49hF4k5Ycq19nGecg4LfC0yMUciolY-9u8zD5fO8YuENcrsblDnG5Y1x1493DWV-CH_vsYxjK3zXLJUh1eP_myA2I-GcsRX3KjfgF0n6btA</recordid><startdate>20071101</startdate><enddate>20071101</enddate><creator>Chew, P.</creator><creator>Yeap, C.B.</creator><creator>Cham, J.</creator><creator>Goh, A.</creator><creator>Rossi, N.</creator><creator>Singh, R.</creator><creator>Ong, K.</creator><creator>Toh, H.T.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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Testing</topic><topic>Electric potential</topic><topic>Electromigration</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Failure</topic><topic>Integrated circuits</topic><topic>linewidth</topic><topic>Manufacturing</topic><topic>Markets</topic><topic>Mass production</topic><topic>Morphology</topic><topic>particle sources</topic><topic>Potential well</topic><topic>scrapped wafers</topic><topic>selectivity</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. 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Such a compromise could result in electrical shorts and hence failure to yield at the end of the line or, worse, could result in reliability failure such as electromigration if the film morphology or linewidth is affected. As a result of such potential failures, wafers with these types of problems are usually scrapped at the point of detection inline. Scrapping wafers in the line or, worse, at the end of the line, results in financial loss as well as potential delivery problems to customers if there are no backup wafers in the vicinity of the affected step to replace the scrapped wafers. Missing timely delivery to a customer may impact not only the immediate customer but also the customer's customers who may be dependent upon uninterrupted and timely supply in their lean supply chain management system. 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subjects | Aluminum Applied sciences clean surface controlled removal Customers Design. Technologies. Operation analysis. Testing Electric potential Electromigration Electronics Exact sciences and technology Failure Integrated circuits linewidth Manufacturing Markets Mass production Morphology particle sources Potential well scrapped wafers selectivity Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductors shorts successful recovery Supply chain management Supply chains Testing Time to market Wafers |
title | A Method to Recover Defective Aluminum Interconnect Films in Mass Production |
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