Multiple-gate SOI MOSFETs: device design guidelines

This paper describes computer simulations of various SOI MOSFETs with double and triple-gate structures, as well as gate-all-around devices. The concept of a triple-gate device with sidewalls extending into the buried oxide (hereby called a "/spl Pi/-gate" or "Pi-gate" MOSFET) is...

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Veröffentlicht in:IEEE transactions on electron devices 2002-12, Vol.49 (12), p.2222-2229
Hauptverfasser: Jong-Tae Park, Colinge, J.-P.
Format: Artikel
Sprache:eng
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