Modification of titanium surface during its chemical etching in fluoride-containing media

Modification of titanium surface during its chemical etching in fluoride-containing media

The effects of solution composition on the electrical and other physical properties of surface films formed during the titanium chemical etching in fluoride-containing media are studied. It is shown that the formation of resistive oxide films results in the surface leveling and an increase in its re...

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Veröffentlicht in:Protection of metals 2007-05, Vol.43 (3), p.285-287
Hauptverfasser: Dontsov, M G, Balmasov, A V, Balukova, A A, Nevskii, O I
Format: Artikel
Sprache:eng
Schlagworte:
Alloys
Fluorides
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Zusammenfassung:The effects of solution composition on the electrical and other physical properties of surface films formed during the titanium chemical etching in fluoride-containing media are studied. It is shown that the formation of resistive oxide films results in the surface leveling and an increase in its reflectivity.[PUBLICATION ABSTRACT]
ISSN:0033-1732
2070-2051
1608-327X
2070-206X
DOI:10.1134/S0033173207030149