Dislocation-related photoluminescence from processed Si

Dislocation-related photoluminescence (PL) from oxygen containing Czochralski silicon (Cz-Si) processed at up to 1,400 K (HT) under atmospheric and enhanced Ar pressures (HP, up to 1.2 GPa) has been investigated. Appropriate processing of Cz-Si results in a creation of oxygen precipitates and of related defects, e.g., dislocations. Depending on processing conditions, the dislocation-related PL lines at about 0.81 and 0.87 eV are of the highest intensity while PL peaks also at 0.84 and 0.94 eV. The subsequent treatments of processed Cz-Si under pulse HP up to 2 GPa at room temperature affect PL intensity, also because of annihilation of non-radiative recombination centers formed at HT–(HP). Specific HT–HP treatments, influencing a creation of oxygen precipitates and a creation/annihilation of non-radiative recombination centers, make possible to tailor PL from Cz-Si.