Structural, optoelectronic and electrochemical properties of nickel oxide films

Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films were post annealed in air at 450–500 °C for 5 h and the effect of annealing on the structural, microstructural, electrical and optical properties were studied. X-ray diffraction studies indicated the p...

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Veröffentlicht in:	Journal of materials science. Materials in electronics 2009-10, Vol.20 (10), p.953-957
Hauptverfasser:	Subramanian, B., Mohammed Ibrahim, M., Murali, K. R., Vidhya, V. S., Sanjeeviraja, C., Jayachandran, M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Alloys Annealing Applied sciences Characterization and Evaluation of Materials Chemistry and Materials Science Circuit properties Cold working, work hardening annealing, quenching, tempering, recovery, and recrystallization textures Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electric, optical and optoelectronic circuits Electronics Electrooptical effects Exact sciences and technology Heat treatment Integrated optoelectronics. Optoelectronic circuits Materials Science Metallurgy Metals. Metallurgy Optical and Electronic Materials Optical and optoelectronic circuits Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Production techniques Treatment of materials and its effects on microstructure and properties
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