Fabricating low-loss hollow optical waveguides via amorphous silicon bonding using dilute KOH solvent

Fabricating low-loss hollow optical waveguides via amorphous silicon bonding using dilute KOH solvent

This work explicates a method for fabricating a hollow optical waveguide. Dilute KOH solvent was used to bond two omni-directional reflector (ODR) Si wafers to an amorphous Si thin film on the top of a Si wafer. The resultant bonding interface is very thin, with a thickness that is close to that of...

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Veröffentlicht in:IEEE photonics technology letters 2005-12, Vol.17 (12), p.2592-2594
Hauptverfasser: Lo, Shih-Shou, Chiu, Hua-Kung, Chen, Chii-Chang, Hsu, Shih-Chieh, Liu, Cheng-Yi
Format: Artikel
Sprache:eng
Schlagworte:
Amorphous silicon
Bonding
Dilution
hollow
Hollow waveguides
Optical films
Optical sensors
optical waveguide
Optical waveguides
Plasma temperature
Propagation losses
Semiconductor thin films
Silicon
Solvents
Wafer bonding
Wafers
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Beschreibung
Zusammenfassung:This work explicates a method for fabricating a hollow optical waveguide. Dilute KOH solvent was used to bond two omni-directional reflector (ODR) Si wafers to an amorphous Si thin film on the top of a Si wafer. The resultant bonding interface is very thin, with a thickness that is close to that of a SiO/sub 2/ layer in the ODR substrate. Therefore, the far field image reveals that light is strongly confined in the hollow optical waveguide.
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2005.859137