Quantum-mechanical effects in trigate SOI MOSFETs

A self-consistent Poisson-Schro/spl uml/dinger solver is used to calculate the current in trigate n-channel silicon-on-insulator transistors with sections down to 2 nm /spl times/ 2 nm. The minimum energy of the subbands and the threshold voltage increase as the cross-sectional area of the device is...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 2006-05, Vol.53 (5), p.1131-1136
Hauptverfasser: Colinge, J.-P., Alderman, J.C., Weize Xiong, Cleavelin, C.R.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1136
container_issue 5
container_start_page 1131
container_title IEEE transactions on electron devices
container_volume 53
creator Colinge, J.-P.
Alderman, J.C.
Weize Xiong
Cleavelin, C.R.
description A self-consistent Poisson-Schro/spl uml/dinger solver is used to calculate the current in trigate n-channel silicon-on-insulator transistors with sections down to 2 nm /spl times/ 2 nm. The minimum energy of the subbands and the threshold voltage increase as the cross-sectional area of the device is reduced and as the electron concentration in the channel is increased. As a consequence, the threshold voltage is higher than predicted by classical Poisson solvers. The current drive is diminished, and the subthreshold slope is degraded, especially in the devices with the smallest cross sections.
doi_str_mv 10.1109/TED.2006.871872
format Article
fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_865166668</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1624694</ieee_id><sourcerecordid>2340436451</sourcerecordid><originalsourceid>FETCH-LOGICAL-c411t-a39196980ca0c766744b31cef687a037bb25a481380605c1da6a84b30379c9ba3</originalsourceid><addsrcrecordid>eNp9kM9LwzAUx4MoOKdnD16KoHjplpek-XGUOXUwGbJ5DmlMtaNrZ9Ie_O9N6UDwYC6P5H3eN7wPQpeAJwBYTTfzhwnBmE-kACnIERpBlolUccaP0QhjkKmikp6isxC28coZIyMEr52p226X7pz9NHVpTZW4onC2DUlZJ60vP0zrkvVqkbys1o_zTThHJ4Wpgrs41DF6i8-z53S5elrM7pepZQBtaqgCxZXE1mArOBeM5RSsK7gUBlOR5yQzTAKVmOPMwrvhRkYktpRVuaFjdDvk7n3z1bnQ6l0ZrKsqU7umC5pILDLgNIJ3_4LABRDBFJcRvf6DbpvO13ENLXkMi6eHpgNkfROCd4Xe-3Jn_LcGrHvVOqrWvWo9qI4TN4dYE6LAwpvaluF3TMTfCem5q4ErnXO_bU4YV4z-AI_zgts</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>865166668</pqid></control><display><type>article</type><title>Quantum-mechanical effects in trigate SOI MOSFETs</title><source>IEEE Xplore</source><creator>Colinge, J.-P. ; Alderman, J.C. ; Weize Xiong ; Cleavelin, C.R.</creator><creatorcontrib>Colinge, J.-P. ; Alderman, J.C. ; Weize Xiong ; Cleavelin, C.R.</creatorcontrib><description>A self-consistent Poisson-Schro/spl uml/dinger solver is used to calculate the current in trigate n-channel silicon-on-insulator transistors with sections down to 2 nm /spl times/ 2 nm. The minimum energy of the subbands and the threshold voltage increase as the cross-sectional area of the device is reduced and as the electron concentration in the channel is increased. As a consequence, the threshold voltage is higher than predicted by classical Poisson solvers. The current drive is diminished, and the subthreshold slope is degraded, especially in the devices with the smallest cross sections.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2006.871872</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Channels ; Cross sections ; Devices ; Electronics ; Exact sciences and technology ; Mathematical analysis ; MOSFETs ; Quantum wires ; Semiconductor device modeling ; Semiconductor devices ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicon on insulator technology ; silicon-on-insulator (SOI) technology ; Solvers ; Threshold voltage ; Transistors</subject><ispartof>IEEE transactions on electron devices, 2006-05, Vol.53 (5), p.1131-1136</ispartof><rights>2006 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2006</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c411t-a39196980ca0c766744b31cef687a037bb25a481380605c1da6a84b30379c9ba3</citedby><cites>FETCH-LOGICAL-c411t-a39196980ca0c766744b31cef687a037bb25a481380605c1da6a84b30379c9ba3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1624694$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1624694$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=17749222$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Colinge, J.-P.</creatorcontrib><creatorcontrib>Alderman, J.C.</creatorcontrib><creatorcontrib>Weize Xiong</creatorcontrib><creatorcontrib>Cleavelin, C.R.</creatorcontrib><title>Quantum-mechanical effects in trigate SOI MOSFETs</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>A self-consistent Poisson-Schro/spl uml/dinger solver is used to calculate the current in trigate n-channel silicon-on-insulator transistors with sections down to 2 nm /spl times/ 2 nm. The minimum energy of the subbands and the threshold voltage increase as the cross-sectional area of the device is reduced and as the electron concentration in the channel is increased. As a consequence, the threshold voltage is higher than predicted by classical Poisson solvers. The current drive is diminished, and the subthreshold slope is degraded, especially in the devices with the smallest cross sections.</description><subject>Applied sciences</subject><subject>Channels</subject><subject>Cross sections</subject><subject>Devices</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Mathematical analysis</subject><subject>MOSFETs</subject><subject>Quantum wires</subject><subject>Semiconductor device modeling</subject><subject>Semiconductor devices</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicon on insulator technology</subject><subject>silicon-on-insulator (SOI) technology</subject><subject>Solvers</subject><subject>Threshold voltage</subject><subject>Transistors</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNp9kM9LwzAUx4MoOKdnD16KoHjplpek-XGUOXUwGbJ5DmlMtaNrZ9Ie_O9N6UDwYC6P5H3eN7wPQpeAJwBYTTfzhwnBmE-kACnIERpBlolUccaP0QhjkKmikp6isxC28coZIyMEr52p226X7pz9NHVpTZW4onC2DUlZJ60vP0zrkvVqkbys1o_zTThHJ4Wpgrs41DF6i8-z53S5elrM7pepZQBtaqgCxZXE1mArOBeM5RSsK7gUBlOR5yQzTAKVmOPMwrvhRkYktpRVuaFjdDvk7n3z1bnQ6l0ZrKsqU7umC5pILDLgNIJ3_4LABRDBFJcRvf6DbpvO13ENLXkMi6eHpgNkfROCd4Xe-3Jn_LcGrHvVOqrWvWo9qI4TN4dYE6LAwpvaluF3TMTfCem5q4ErnXO_bU4YV4z-AI_zgts</recordid><startdate>20060501</startdate><enddate>20060501</enddate><creator>Colinge, J.-P.</creator><creator>Alderman, J.C.</creator><creator>Weize Xiong</creator><creator>Cleavelin, C.R.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope><scope>7U5</scope></search><sort><creationdate>20060501</creationdate><title>Quantum-mechanical effects in trigate SOI MOSFETs</title><author>Colinge, J.-P. ; Alderman, J.C. ; Weize Xiong ; Cleavelin, C.R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c411t-a39196980ca0c766744b31cef687a037bb25a481380605c1da6a84b30379c9ba3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Applied sciences</topic><topic>Channels</topic><topic>Cross sections</topic><topic>Devices</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Mathematical analysis</topic><topic>MOSFETs</topic><topic>Quantum wires</topic><topic>Semiconductor device modeling</topic><topic>Semiconductor devices</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicon on insulator technology</topic><topic>silicon-on-insulator (SOI) technology</topic><topic>Solvers</topic><topic>Threshold voltage</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Colinge, J.-P.</creatorcontrib><creatorcontrib>Alderman, J.C.</creatorcontrib><creatorcontrib>Weize Xiong</creatorcontrib><creatorcontrib>Cleavelin, C.R.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005–Present</collection><collection>IEEE All-Society Periodicals Package (ASPP) Online</collection><collection>IEEE Xplore</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology &amp; Engineering</collection><collection>Engineering Research Database</collection><collection>Solid State and Superconductivity Abstracts</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Colinge, J.-P.</au><au>Alderman, J.C.</au><au>Weize Xiong</au><au>Cleavelin, C.R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Quantum-mechanical effects in trigate SOI MOSFETs</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2006-05-01</date><risdate>2006</risdate><volume>53</volume><issue>5</issue><spage>1131</spage><epage>1136</epage><pages>1131-1136</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>A self-consistent Poisson-Schro/spl uml/dinger solver is used to calculate the current in trigate n-channel silicon-on-insulator transistors with sections down to 2 nm /spl times/ 2 nm. The minimum energy of the subbands and the threshold voltage increase as the cross-sectional area of the device is reduced and as the electron concentration in the channel is increased. As a consequence, the threshold voltage is higher than predicted by classical Poisson solvers. The current drive is diminished, and the subthreshold slope is degraded, especially in the devices with the smallest cross sections.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TED.2006.871872</doi><tpages>6</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0018-9383
ispartof IEEE transactions on electron devices, 2006-05, Vol.53 (5), p.1131-1136
issn 0018-9383
1557-9646
language eng
recordid cdi_proquest_journals_865166668
source IEEE Xplore
subjects Applied sciences
Channels
Cross sections
Devices
Electronics
Exact sciences and technology
Mathematical analysis
MOSFETs
Quantum wires
Semiconductor device modeling
Semiconductor devices
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon on insulator technology
silicon-on-insulator (SOI) technology
Solvers
Threshold voltage
Transistors
title Quantum-mechanical effects in trigate SOI MOSFETs
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T09%3A32%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Quantum-mechanical%20effects%20in%20trigate%20SOI%20MOSFETs&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Colinge,%20J.-P.&rft.date=2006-05-01&rft.volume=53&rft.issue=5&rft.spage=1131&rft.epage=1136&rft.pages=1131-1136&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2006.871872&rft_dat=%3Cproquest_RIE%3E2340436451%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=865166668&rft_id=info:pmid/&rft_ieee_id=1624694&rfr_iscdi=true