Synthesis of nanocrystalline diamond films using CH4 concentration modulated plasma
Microcrystalline diamond (MCD) has excellent characteristics, such as high hardness and high wear resistance, but it also has the disadvantage of high surface roughness. On the other hand, nanocrystalline diamond (NCD) film has the advantage of low surface roughness. However, it contains non-diamond...
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| Veröffentlicht in: | Journal of the Japan Society for Abrasive Technology 2024-01, Vol.68 (7) |
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| container_title | Journal of the Japan Society for Abrasive Technology |
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| creator | OHNISHI, Ryota TANAKA, Ippei KAWAGUCHI, Natsuki HARADA, Yasunori 亮多, 大西 一平, 田中 夏樹, 川口 泰典, 原田 |
| description | Microcrystalline diamond (MCD) has excellent characteristics, such as high hardness and high wear resistance, but it also has the disadvantage of high surface roughness. On the other hand, nanocrystalline diamond (NCD) film has the advantage of low surface roughness. However, it contains non-diamond phases, resulting in a decrease in wear resistance. In this study, CH4 concentration was modulated from 1% to 10% in MCD and NCD synthesis to synthesize high-quality NCD films with high hardness. Conventional NCD film synthesized with a CH4 concentration of 10% had a hardness of 46 GPa, while that synthesized with CH4 concentration modulation had a hardness of 73 GPa. These observations indicated that CH4 concentration modulation increased the hardness and improved the film quality. CH4 modulation can be used to synthesize NCD film with higher hardness and higher quality than conventional NCD film. |
| doi_str_mv | 10.11420/jsat.68.399 |
| format | Article |
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On the other hand, nanocrystalline diamond (NCD) film has the advantage of low surface roughness. However, it contains non-diamond phases, resulting in a decrease in wear resistance. In this study, CH4 concentration was modulated from 1% to 10% in MCD and NCD synthesis to synthesize high-quality NCD films with high hardness. Conventional NCD film synthesized with a CH4 concentration of 10% had a hardness of 46 GPa, while that synthesized with CH4 concentration modulation had a hardness of 73 GPa. These observations indicated that CH4 concentration modulation increased the hardness and improved the film quality. CH4 modulation can be used to synthesize NCD film with higher hardness and higher quality than conventional NCD film.</description><identifier>ISSN: 0914-2703</identifier><identifier>EISSN: 1880-7534</identifier><identifier>DOI: 10.11420/jsat.68.399</identifier><language>eng ; jpn</language><publisher>Tokyo: Japan Science and Technology Agency</publisher><subject>Diamond films ; Hardness ; Modulation ; Surface roughness ; Synthesis ; Wear resistance</subject><ispartof>Journal of the Japan Society for Abrasive Technology, 2024-01, Vol.68 (7)</ispartof><rights>Copyright Japan Science and Technology Agency 2024</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>OHNISHI, Ryota</creatorcontrib><creatorcontrib>TANAKA, Ippei</creatorcontrib><creatorcontrib>KAWAGUCHI, Natsuki</creatorcontrib><creatorcontrib>HARADA, Yasunori</creatorcontrib><creatorcontrib>亮多, 大西</creatorcontrib><creatorcontrib>一平, 田中</creatorcontrib><creatorcontrib>夏樹, 川口</creatorcontrib><creatorcontrib>泰典, 原田</creatorcontrib><title>Synthesis of nanocrystalline diamond films using CH4 concentration modulated plasma</title><title>Journal of the Japan Society for Abrasive Technology</title><description>Microcrystalline diamond (MCD) has excellent characteristics, such as high hardness and high wear resistance, but it also has the disadvantage of high surface roughness. On the other hand, nanocrystalline diamond (NCD) film has the advantage of low surface roughness. However, it contains non-diamond phases, resulting in a decrease in wear resistance. In this study, CH4 concentration was modulated from 1% to 10% in MCD and NCD synthesis to synthesize high-quality NCD films with high hardness. Conventional NCD film synthesized with a CH4 concentration of 10% had a hardness of 46 GPa, while that synthesized with CH4 concentration modulation had a hardness of 73 GPa. These observations indicated that CH4 concentration modulation increased the hardness and improved the film quality. CH4 modulation can be used to synthesize NCD film with higher hardness and higher quality than conventional NCD film.</description><subject>Diamond films</subject><subject>Hardness</subject><subject>Modulation</subject><subject>Surface roughness</subject><subject>Synthesis</subject><subject>Wear resistance</subject><issn>0914-2703</issn><issn>1880-7534</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNqNyrFuwjAQgGGrolIjYOMBTuqc4IuTEM-oFTvs0ZE4xcg505wz8Pbt0Afo9A_fr9QOdYFYlXp_F0pF0xbG2heVYdvq_FCbaqUybbHKy4M2b2or4q9aa9tgYzBT5_OT082JF4gjMHHs56ckCsGzg8HTFHmA0YdJYBHPX3A8VdBH7h2nmZKPDFMclkDJDfAIJBNt1OtIQdz2r2v1_vlxOZ7yxxy_Fyepu8dl5l_qDNZ1bUq01vzv-gGv2EfK</recordid><startdate>20240101</startdate><enddate>20240101</enddate><creator>OHNISHI, Ryota</creator><creator>TANAKA, Ippei</creator><creator>KAWAGUCHI, Natsuki</creator><creator>HARADA, Yasunori</creator><creator>亮多, 大西</creator><creator>一平, 田中</creator><creator>夏樹, 川口</creator><creator>泰典, 原田</creator><general>Japan Science and Technology Agency</general><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20240101</creationdate><title>Synthesis of nanocrystalline diamond films using CH4 concentration modulated plasma</title><author>OHNISHI, Ryota ; TANAKA, Ippei ; KAWAGUCHI, Natsuki ; HARADA, Yasunori ; 亮多, 大西 ; 一平, 田中 ; 夏樹, 川口 ; 泰典, 原田</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_journals_31555321993</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng ; jpn</language><creationdate>2024</creationdate><topic>Diamond films</topic><topic>Hardness</topic><topic>Modulation</topic><topic>Surface roughness</topic><topic>Synthesis</topic><topic>Wear resistance</topic><toplevel>online_resources</toplevel><creatorcontrib>OHNISHI, Ryota</creatorcontrib><creatorcontrib>TANAKA, Ippei</creatorcontrib><creatorcontrib>KAWAGUCHI, Natsuki</creatorcontrib><creatorcontrib>HARADA, Yasunori</creatorcontrib><creatorcontrib>亮多, 大西</creatorcontrib><creatorcontrib>一平, 田中</creatorcontrib><creatorcontrib>夏樹, 川口</creatorcontrib><creatorcontrib>泰典, 原田</creatorcontrib><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the Japan Society for Abrasive Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>OHNISHI, Ryota</au><au>TANAKA, Ippei</au><au>KAWAGUCHI, Natsuki</au><au>HARADA, Yasunori</au><au>亮多, 大西</au><au>一平, 田中</au><au>夏樹, 川口</au><au>泰典, 原田</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Synthesis of nanocrystalline diamond films using CH4 concentration modulated plasma</atitle><jtitle>Journal of the Japan Society for Abrasive Technology</jtitle><date>2024-01-01</date><risdate>2024</risdate><volume>68</volume><issue>7</issue><issn>0914-2703</issn><eissn>1880-7534</eissn><abstract>Microcrystalline diamond (MCD) has excellent characteristics, such as high hardness and high wear resistance, but it also has the disadvantage of high surface roughness. On the other hand, nanocrystalline diamond (NCD) film has the advantage of low surface roughness. However, it contains non-diamond phases, resulting in a decrease in wear resistance. In this study, CH4 concentration was modulated from 1% to 10% in MCD and NCD synthesis to synthesize high-quality NCD films with high hardness. Conventional NCD film synthesized with a CH4 concentration of 10% had a hardness of 46 GPa, while that synthesized with CH4 concentration modulation had a hardness of 73 GPa. These observations indicated that CH4 concentration modulation increased the hardness and improved the film quality. CH4 modulation can be used to synthesize NCD film with higher hardness and higher quality than conventional NCD film.</abstract><cop>Tokyo</cop><pub>Japan Science and Technology Agency</pub><doi>10.11420/jsat.68.399</doi></addata></record> |
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| language | eng ; jpn |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals |
| subjects | Diamond films Hardness Modulation Surface roughness Synthesis Wear resistance |
| title | Synthesis of nanocrystalline diamond films using CH4 concentration modulated plasma |
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