Atomic surface of diamond induced by novel green photocatalytic chemical mechanical polishing with high material removal rate

Atomic surfaces are strictly required by high-performance devices of diamond. Nevertheless, diamond is the hardest material in nature, leading to the low material removal rate (MRR) and high surface roughness during machining. Noxious slurries are widely used in conventional chemical mechanical poli...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	International Journal of Extreme Manufacturing 2025-04, Vol.7 (2), p.025102
Hauptverfasser:	Yu, Zhibin, Zhang, Zhenyu, Zeng, Zinuo, Fan, Cheng, Gu, Yang, Shi, Chunjing, Zhou, Hongxiu, Meng, Fanning, Feng, Junyuan
Format:	Artikel
Sprache:	eng
Schlagworte:	atomic diamond surface Atomic structure Catalysts Chemical-mechanical polishing diamond Diamond machining Diamond polishing Electron paramagnetic resonance Electrons Hydrogen peroxide material removal rate Material removal rate (machining) photocatalytic chemical mechanical polishing photocatalytic Fenton reaction Photoelectrons Pigments Radiation damage Radicals Single crystals Slurries Surface roughness Thickness Transmission electron microscopy Ultraviolet radiation X ray photoelectron spectroscopy
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!