On prognosis of mismatch-induced stress during growth of films in the framework of magnetron sputtering

In this paper, we analyzed mass transfer during growth of epitaxial layers during magnetron sputtering. During the analysis, we investigate modifications of properties of films with variation of several parameters. We analyzed the possibility of decreased mismatch-induced stress on the considered fi...

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Veröffentlicht in:	International journal of advanced manufacturing technology 2024-12, Vol.135 (7-8), p.3673-3679
1. Verfasser:	Pankratov, Evgeny Leonidovich
Format:	Artikel
Sprache:	eng
Schlagworte:	Advanced manufacturing technologies Approximation CAE) and Design Computer-Aided Engineering (CAD Engineering Epitaxial growth Epitaxial layers Industrial and Production Engineering Magnetic fields Magnetic properties Magnetron sputtering Manufacturing Mass transfer Mechanical Engineering Media Management Molecular beam epitaxy Original Article Parameter modification
Online-Zugang:	Volltext
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