Influence of Etching Modes on the Morphology and Composition of the Surface of Multilayer Porous Silicon

Influence of Etching Modes on the Morphology and Composition of the Surface of Multilayer Porous Silicon

Based on X-ray reflectometry and ultrasoft X-ray spectroscopy data, the opportunity of controlling surface porosity using multi-stage electrochemical etching modes is presented. It is presented how, with an increase in the porosity index of the near-surface layer, the morphology changes and the degr...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2024-02, Vol.58 (2), p.145-148
Hauptverfasser: Lenshin, A. S., Peshkov, Ya. A., Chernousova, O. V., Barkov, K. A., Kannykin, S. V.
Format: Artikel
Sprache:eng
Schlagworte:
Electrochemical etching
Magnetic Materials
Magnetism
Morphology
Multilayers
Oxidation
Physics
Physics and Astronomy
Porosity
Porous silicon
Surface layers
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Zusammenfassung:Based on X-ray reflectometry and ultrasoft X-ray spectroscopy data, the opportunity of controlling surface porosity using multi-stage electrochemical etching modes is presented. It is presented how, with an increase in the porosity index of the near-surface layer, the morphology changes and the degree of oxidation of multilayer porous silicon samples increases.
ISSN:1063-7826
1090-6479
DOI:10.1134/S106378262402009X