P‐99: A New Unit‐cell Type Fine Metal Mask for IT & Gen8.x AMOLED Applications

In this study, we explore the feasibility of employing a unit‐cell type fine metal mask (uc‐FMM) for IT and Gen8.x AMOLED applications, which currently represent the forefront of the OLED industry in the upcoming era. The conventional stick‐type fine metal mask (FMM) raised concerns about lateral wrinkling with increasing mask width, particularly affecting middle and large‐sized displays and the overall panel efficiency of glass design. Our focus lies in understanding the tension relationships within the mask and the open mask used as a sub‐frame for support. The tensions involved—T1 for the metal mask, T2 for the open mask, and T3 at the welding points—all play crucial roles. We utilized portable X‐ray diffraction (XRD) to measure these tensions accurately. Of particular significance is T3, which we analyzed in relation to welding morphology, welded adhesion, and material properties. By experimenting with different invar materials and welding lasers, we established quantitative relationships. Our findings strongly indicate that uc‐FMM presents a compelling and inevitable solution for the future of OLED technology.