The solid-phase ion-plasma method and thermoelectric properties of thin CrSi2 films

Thin films of CrSi 2 of various thicknesses, deposited on the Si(111) surface using magnetron sputtering, have been examined through a combination of electron spectroscopy and microscopy techniques. In this article, the mechanism of film formation by sputtering in very short times by the method of m...

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Veröffentlicht in:	Journal of materials science. Materials in electronics 2024-07, Vol.35 (20), p.1426, Article 1426
Hauptverfasser:	Bekpulatov, I. R., Imanova, G. T., Jabarov, S. H., Umirzakov, B. E., Dovranov, K. T., Loboda, V. V., Turapov, I. X., Norbutaev, N. E., Sayyed, M. I., Tishkevich, D. I., Trukhanov, A. V.
Format:	Artikel
Sprache:	eng
Schlagworte:	Characterization and Evaluation of Materials Chemistry and Materials Science Dielectric properties Electrical resistivity Excitation spectra Magnetic properties Magnetron sputtering Materials Science Optical and Electronic Materials Photoelectrons Polycrystals Power factor Seebeck effect Silicon dioxide Silicon substrates Solid phases Thermoelectricity Thickness Thin films
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