Deposition and characterization of ZnO thin films on corning glass substrate using Magnetron sputtering

The Zinc Oxide (ZnO) thin films were deposited on corning glass substrates using RF Magnetron sputtering at a substrate temperature of 400° C and thicknesses of 1000 nm and 2000 nm. SEM, EDX, XRD, and UV-Vis spectrometers were used to analyse the thin films’ morphological, structural, and optical characteristics. SEMwas used to analyse the surface morphology of the thin films. The composition of the created thin films was evaluated using EDX. XRD was used to examine the crystalline structure of the deposited ZnO films. Using the Debye-Scherrer equation, the average sample crystal size was determined. Uv-Vis was used to analyse the optical characteristics of the thin films. The findings showing how well-piezoelectric the produced thin films are may be useful in developing Surface Acoustic Wave Devices.