Tuning the Optoelectronic Properties of Pulsed Laser Deposited “3D”‐MoS2 Films via the Degree of Vertical Alignment of Their Constituting Layers

Pulsed‐laser‐deposition (PLD) is used to deposit MoS2 thin films at substrate temperatures (Td) ranging from 25 to 700 °C. A Td = 500 °C is identified as the optimal temperature that yields MoS2 films consisting of highly‐crystallized 2H‐MoS2 phase with a strong (002) preferential orientation, a dir...

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Veröffentlicht in:	Advanced optical materials 2024-05, Vol.12 (15), p.n/a
Hauptverfasser:	Mouloua, Driss, LeBlanc‐Lavoie, Joël, Pichon, Loick, Rajput, Nitul S, El Marssi, Mimoun, Jouiad, Mustapha, El Khakani, My Ali
Format:	Artikel
Sprache:	eng
Schlagworte:	Alignment bandgap Crystallization Energy gap Film thickness Molybdenum disulfide MoS2 films Optoelectronics photodetection PLD Pulsed laser deposition Pulsed lasers Raman spectroscopy Substrates Thin films Tuning vertically‐layered materials
Online-Zugang:	Volltext
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