Transfer-free chemical vapor deposition graphene for nitride epitaxy: challenges, current status and future outlook

Graphene, a two-dimensional material with outstanding electrical and mechanical properties, has attracted considerable attention in the field of semiconductor technologies due to its potential use as a buffer layer for the epitaxial III-nitride growth. In recent years, significant progress has been made in the chemical vapor deposition growth of graphene on various insulating substrates for the nitride epitaxy, which offers a facile, inexpensive, and easily scalable methodology. However, certain challenges are still present in the form of producing high-quality graphene and achieving optimal interface compatibility with III-nitride materials. In this review, we provide an overview of the bottlenecks associated with the transferred graphene fabrication techniques and the state-of-the-art techniques for the transfer-free graphene growth. The present contribution highlights the current progress in the transfer-free graphene growth on different insulating substrates, including sapphire, quartz, SiO 2 /Si, and discusses the potential applications of transfer-free graphene in the III-nitride epitaxy. Finally, it includes the prospects of the transfer-free graphene growth for the III-nitride epitaxy and the challenges that should be overcome to realize its full potential in this field.