Experimental investigation of chemical mechanical polishing (CMP) process parameters through polishing of optical glass

Due to the high precision and surface accuracy, optical quartz glass’s chemical mechanical polishing (CMP) is a challenge. Quartz glass, also known as fused silica (SiO2), is a popular optical material due to its high transmission range, hardness, strength, and chemically inertness properties. This...

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Bibliographische Detailangaben

Hauptverfasser:	Parashar, Aparajita, Kumar, Manoj, Pal, Raj Kumar, Karar, Vinod
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Abrasives Cerium oxides Chemical-mechanical polishing Fused silica Material removal rate (machining) Optical glass Optical materials Process parameters Silica glass Silicon dioxide Surface roughness Velocity Workpieces
Online-Zugang:	Volltext
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