Thermogravimetric study of metal–organic precursors and their suitability for hybrid molecular beam epitaxy
Although metal–organic (MO) precursors are widely used in technologically relevant deposition techniques, reports on their temperature-dependent evaporation and decomposition behaviors are scarce. Here, MO precursors of the metals Ti, V, Al, Hf, Zr, Ge, Ta, and Pt were subjected to thermogravimetric...
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| Veröffentlicht in: | Journal of materials research 2024-02, Vol.39 (3), p.436-448 |
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| creator | Fazlioglu-Yalcin, Benazir Hilse, Maria Engel-Herbert, Roman |
| description | Although metal–organic (MO) precursors are widely used in technologically relevant deposition techniques, reports on their temperature-dependent evaporation and decomposition behaviors are scarce. Here, MO precursors of the metals Ti, V, Al, Hf, Zr, Ge, Ta, and Pt were subjected to thermogravimetric analysis to experimentally determine their vapor pressure curves and to gain insight into their temperature-dependent decomposition kinetics. Benzoic acid was used as a calibration standard and vapor pressure curves were extracted from thermogravimetric measurements using the Langmuir equation. The obtained data is used to discuss the suitability of these MO precursors in chemical vapor deposition-based thin film growth approaches in general, and hybrid molecular beam epitaxy in particular. All MOs, except for Ta- and one Ti-based MOs, were deemed suitable for gas inlet systems. The Ta-based MO demonstrated suitability for an effusion cell, while all MOs showed compatibility with cracker usage.
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| doi_str_mv | 10.1557/s43578-023-01237-w |
| format | Article |
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Graphical Abstract</description><subject>Applied and Technical Physics</subject><subject>Benzoic acid</subject><subject>Biomaterials</subject><subject>Chemical vapor deposition</subject><subject>Chemistry and Materials Science</subject><subject>Decomposition</subject><subject>Epitaxial growth</subject><subject>Film growth</subject><subject>Germanium</subject><subject>Inorganic Chemistry</subject><subject>Materials Engineering</subject><subject>Materials Science</subject><subject>Molecular beam epitaxy</subject><subject>Nanotechnology</subject><subject>Precursors</subject><subject>Tantalum</subject><subject>Temperature dependence</subject><subject>Thermogravimetric analysis</subject><subject>Thin films</subject><subject>Titanium</subject><subject>Vapor pressure</subject><subject>Zirconium</subject><issn>0884-2914</issn><issn>2044-5326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><recordid>eNp9kMtKxDAUhoMoOI6-gKuA62hunaRLGbzBgBtdh6RNZzq0TT1pHbvzHXxDn8ToCO5cHQ7n-_8DH0LnjF6yLFNXUYpMaUK5IJRxocjuAM04lZJkgi8O0YxqLQnPmTxGJzFuKWUZVXKG2qeNhzaswb7WrR-gLnAcxnLCocJpt83n-0eAte3SoQdfjBADRGy7Eg8bXwOOYz1YVzf1MOEqAN5MDuoSt6FJcGMBO29b7PtEvU2n6KiyTfRnv3OOnm9vnpb3ZPV497C8XpFCMDmQghVaVZQ66TmrrHbM2VJz6x1baMl05nihKq1KRgsvpRLMC-Wt5TIXTtBKzNHFvreH8DL6OJhtGKFLLw3PueQ5zXKRKL6nCggxgq9MD3VrYTKMmm-tZq_VJK3mR6vZpZDYh2KCu7WHv-p_Ul-zzH9G</recordid><startdate>20240214</startdate><enddate>20240214</enddate><creator>Fazlioglu-Yalcin, Benazir</creator><creator>Hilse, Maria</creator><creator>Engel-Herbert, Roman</creator><general>Springer International Publishing</general><general>Springer Nature B.V</general><scope>C6C</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0003-3873-706X</orcidid></search><sort><creationdate>20240214</creationdate><title>Thermogravimetric study of metal–organic precursors and their suitability for hybrid molecular beam epitaxy</title><author>Fazlioglu-Yalcin, Benazir ; Hilse, Maria ; Engel-Herbert, Roman</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c314t-c1c87f00b4e21fa8b1bad82aeb1684185b2c7f87d10ce44731e37eaa2493b30f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Applied and Technical Physics</topic><topic>Benzoic acid</topic><topic>Biomaterials</topic><topic>Chemical vapor deposition</topic><topic>Chemistry and Materials Science</topic><topic>Decomposition</topic><topic>Epitaxial growth</topic><topic>Film growth</topic><topic>Germanium</topic><topic>Inorganic Chemistry</topic><topic>Materials Engineering</topic><topic>Materials Science</topic><topic>Molecular beam epitaxy</topic><topic>Nanotechnology</topic><topic>Precursors</topic><topic>Tantalum</topic><topic>Temperature dependence</topic><topic>Thermogravimetric analysis</topic><topic>Thin films</topic><topic>Titanium</topic><topic>Vapor pressure</topic><topic>Zirconium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fazlioglu-Yalcin, Benazir</creatorcontrib><creatorcontrib>Hilse, Maria</creatorcontrib><creatorcontrib>Engel-Herbert, Roman</creatorcontrib><collection>Springer Nature OA Free Journals</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of materials research</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fazlioglu-Yalcin, Benazir</au><au>Hilse, Maria</au><au>Engel-Herbert, Roman</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Thermogravimetric study of metal–organic precursors and their suitability for hybrid molecular beam epitaxy</atitle><jtitle>Journal of materials research</jtitle><stitle>Journal of Materials Research</stitle><date>2024-02-14</date><risdate>2024</risdate><volume>39</volume><issue>3</issue><spage>436</spage><epage>448</epage><pages>436-448</pages><issn>0884-2914</issn><eissn>2044-5326</eissn><abstract>Although metal–organic (MO) precursors are widely used in technologically relevant deposition techniques, reports on their temperature-dependent evaporation and decomposition behaviors are scarce. Here, MO precursors of the metals Ti, V, Al, Hf, Zr, Ge, Ta, and Pt were subjected to thermogravimetric analysis to experimentally determine their vapor pressure curves and to gain insight into their temperature-dependent decomposition kinetics. Benzoic acid was used as a calibration standard and vapor pressure curves were extracted from thermogravimetric measurements using the Langmuir equation. The obtained data is used to discuss the suitability of these MO precursors in chemical vapor deposition-based thin film growth approaches in general, and hybrid molecular beam epitaxy in particular. All MOs, except for Ta- and one Ti-based MOs, were deemed suitable for gas inlet systems. The Ta-based MO demonstrated suitability for an effusion cell, while all MOs showed compatibility with cracker usage.
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| subjects | Applied and Technical Physics Benzoic acid Biomaterials Chemical vapor deposition Chemistry and Materials Science Decomposition Epitaxial growth Film growth Germanium Inorganic Chemistry Materials Engineering Materials Science Molecular beam epitaxy Nanotechnology Precursors Tantalum Temperature dependence Thermogravimetric analysis Thin films Titanium Vapor pressure Zirconium |
| title | Thermogravimetric study of metal–organic precursors and their suitability for hybrid molecular beam epitaxy |
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