InAs/Si Hetero-Junction Channel to Enhance the Performance of DG-TFET with Graphene Nanoribbon: an Analytical Model

In this paper, a new two-dimensional analytical model for our proposed InAs/Si based double-gate dual-metal tunnel field-effect transistor (DG-TFET) with graphene nano-ribbon is presented. Incorporating group III-V material in source – channel junction, which in turn forms heterojunction results bet...

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Veröffentlicht in:SILICON 2021-05, Vol.13 (5), p.1453-1459
Hauptverfasser: Dutta, Ritam, Subash, T. D., Paitya, Nitai
Format: Artikel
Sprache:eng
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