InAs/Si Hetero-Junction Channel to Enhance the Performance of DG-TFET with Graphene Nanoribbon: an Analytical Model
In this paper, a new two-dimensional analytical model for our proposed InAs/Si based double-gate dual-metal tunnel field-effect transistor (DG-TFET) with graphene nano-ribbon is presented. Incorporating group III-V material in source – channel junction, which in turn forms heterojunction results bet...
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Veröffentlicht in: | SILICON 2021-05, Vol.13 (5), p.1453-1459 |
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Format: | Artikel |
Sprache: | eng |
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