SVM based layout retargeting for fast and regularized inverse lithography

Inverse lithography technology （ILT）, also known as pixel-based optical proximity correction （PB-OPC）, has shown promising capability in pushing the current 193 nm lithography to its limit. By treating the mask optimization process as an inverse problem in lithography, ILT provides a more complete e...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Frontiers of information technology & electronic engineering 2014-05, Vol.15 (5), p.390-400
Hauptverfasser:	Luo, Kai-sheng, Shi, Zheng, Yan, Xiao-lang, Geng, Zhen
Format:	Artikel
Sprache:	eng
Schlagworte:	Algorithms Communications Engineering Computer Hardware Computer Science Computer Systems Organization and Communication Networks Convergence Electrical Engineering Electronics and Microelectronics Instrumentation Inverse problems Layouts Lithography Manufacturability Networks Optimization Pixels Solution space Spatial filtering Support vector machines
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!