Regularized level-set-based inverse lithography algorithm for IC mask synthesis

Inverse lithography technology （ILT） is one of the promising resolution enhancement techniques, as the advanced IC technology nodes still use the 193 nm light source. In ILT, optical proximity correction （OPC） is treated as an inverse imaging problem to find the optimal solution using a set of mathe...

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Veröffentlicht in:	Frontiers of information technology & electronic engineering 2013-10, Vol.14 (10), p.799-807
Hauptverfasser:	Geng, Zhen, Shi, Zheng, Yan, Xiao-lang, Luo, Kai-sheng
Format:	Artikel
Sprache:	eng
Schlagworte:	Algorithms Communications Engineering Complexity Computer Hardware Computer Science Computer Systems Organization and Communication Networks Electrical Engineering Electronics and Microelectronics Instrumentation Light sources Lithography Manufacturability Networks Optimization Regularization Topology
Online-Zugang:	Volltext
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