Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture
The vacuum ultraviolet (VUV) light source derived from the Kr-He discharge is widely used for organic analysis, however the relevant model that greatly facilitates the design of high-performance VUV light sources remains to be developed. This study explores a model for simulating the light intensity...
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| Veröffentlicht in: | Plasma chemistry and plasma processing 2024, Vol.44 (1), p.547-563 |
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| creator | Yan, Zitao Yu, Zhangqi Wei, Zhiyang Yang, Bo Shu, Jinian Sun, Haohang Li, Zhen |
| description | The vacuum ultraviolet (VUV) light source derived from the Kr-He discharge is widely used for organic analysis, however the relevant model that greatly facilitates the design of high-performance VUV light sources remains to be developed. This study explores a model for simulating the light intensity of the VUV lamps based on the inductively coupled plasma (ICP) discharge in the low-pressure Kr-He mixture. Two typical ICP based light sources, i.e., a 13.56 MHz VUV lamp with an external coil and a 2.65 MHz VUV lamp with an internal coil, were successfully simulated with the COMSOL Multiphysics software coupled with a fluid model. The rate coefficients of the main reactions involved in the production of VUV radiations from Kr-He plasma were summarized and input in the model. The concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
), which are main VUV-generation species, were set as output to evaluate the overall light intensity of the VUV lamp. As a result, the optimal designing parameters (the length and density of the coil and the radius of the lamp) as well as operating parameters (the input power, the pressure inside the lamp, and the mixing ratio of Kr to He) were obtained for the maximum light intensity. The reliability of the model was further verified by comparing the measured photon flux with the simulated concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
) as functions of the pressure and mixing ratio of Kr-He mixture, which showed good agreements in variation tends. The model provides a great convenience for the development of ICP based VUV lamp with high light intensity and stability. |
| doi_str_mv | 10.1007/s11090-023-10386-z |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2916039016</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2916039016</sourcerecordid><originalsourceid>FETCH-LOGICAL-c270t-cfc230c2fdf91125dc1954eaf6c3ea198d01c43a831bf2481a6ee2e048d2d9f03</originalsourceid><addsrcrecordid>eNp9kEtPwzAQhC0EEqXwBzhZ4mxY22keRyiPVgSBBO3VMo7dGuWFnQDtr8clSNw47e5oZlb6EDqlcE4BkgtPKWRAgHFCgacx2e6hEZ0kjKRZGu-jEbCwR5xFh-jI-zeAEOPJCPXPtupL2dmmxo3BuV2tOzyvO11722120nKxxLmsWnwlvS5w8M3roled_dDlBk-bvi2D_FRKX0l8bb1aS7fS2NY4bz5J67T3vdP43pGZxg_2qwvXMTowsvT65HeO0eL25mU6I_nj3Xx6mRPFEuiIMopxUMwUJqOUTQpFs0mkpYkV15JmaQFURVymnL4aFqVUxlozDVFasCIzwMfobOhtXfPea9-Jt6Z3dXgpWEZj4BnQOLjY4FKu8d5pI1pnK-k2goLY4RUDXhHwih-8YhtCfAj5YK5X2v1V_5P6BtGRfpE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2916039016</pqid></control><display><type>article</type><title>Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture</title><source>Springer Online Journals Complete</source><creator>Yan, Zitao ; Yu, Zhangqi ; Wei, Zhiyang ; Yang, Bo ; Shu, Jinian ; Sun, Haohang ; Li, Zhen</creator><creatorcontrib>Yan, Zitao ; Yu, Zhangqi ; Wei, Zhiyang ; Yang, Bo ; Shu, Jinian ; Sun, Haohang ; Li, Zhen</creatorcontrib><description>The vacuum ultraviolet (VUV) light source derived from the Kr-He discharge is widely used for organic analysis, however the relevant model that greatly facilitates the design of high-performance VUV light sources remains to be developed. This study explores a model for simulating the light intensity of the VUV lamps based on the inductively coupled plasma (ICP) discharge in the low-pressure Kr-He mixture. Two typical ICP based light sources, i.e., a 13.56 MHz VUV lamp with an external coil and a 2.65 MHz VUV lamp with an internal coil, were successfully simulated with the COMSOL Multiphysics software coupled with a fluid model. The rate coefficients of the main reactions involved in the production of VUV radiations from Kr-He plasma were summarized and input in the model. The concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
), which are main VUV-generation species, were set as output to evaluate the overall light intensity of the VUV lamp. As a result, the optimal designing parameters (the length and density of the coil and the radius of the lamp) as well as operating parameters (the input power, the pressure inside the lamp, and the mixing ratio of Kr to He) were obtained for the maximum light intensity. The reliability of the model was further verified by comparing the measured photon flux with the simulated concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
) as functions of the pressure and mixing ratio of Kr-He mixture, which showed good agreements in variation tends. The model provides a great convenience for the development of ICP based VUV lamp with high light intensity and stability.</description><identifier>ISSN: 0272-4324</identifier><identifier>EISSN: 1572-8986</identifier><identifier>DOI: 10.1007/s11090-023-10386-z</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Characterization and Evaluation of Materials ; Chemistry ; Chemistry and Materials Science ; Classical Mechanics ; Coils ; Discharge lamps ; Helium plasma ; Inductively coupled plasma ; Inorganic Chemistry ; Light ; Light sources ; Low pressure ; Luminous intensity ; Mathematical models ; Mechanical Engineering ; Mixing ratio ; Mixtures ; Original Paper ; Parameters ; Plasma jets ; Simulation</subject><ispartof>Plasma chemistry and plasma processing, 2024, Vol.44 (1), p.547-563</ispartof><rights>The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c270t-cfc230c2fdf91125dc1954eaf6c3ea198d01c43a831bf2481a6ee2e048d2d9f03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11090-023-10386-z$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11090-023-10386-z$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Yan, Zitao</creatorcontrib><creatorcontrib>Yu, Zhangqi</creatorcontrib><creatorcontrib>Wei, Zhiyang</creatorcontrib><creatorcontrib>Yang, Bo</creatorcontrib><creatorcontrib>Shu, Jinian</creatorcontrib><creatorcontrib>Sun, Haohang</creatorcontrib><creatorcontrib>Li, Zhen</creatorcontrib><title>Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture</title><title>Plasma chemistry and plasma processing</title><addtitle>Plasma Chem Plasma Process</addtitle><description>The vacuum ultraviolet (VUV) light source derived from the Kr-He discharge is widely used for organic analysis, however the relevant model that greatly facilitates the design of high-performance VUV light sources remains to be developed. This study explores a model for simulating the light intensity of the VUV lamps based on the inductively coupled plasma (ICP) discharge in the low-pressure Kr-He mixture. Two typical ICP based light sources, i.e., a 13.56 MHz VUV lamp with an external coil and a 2.65 MHz VUV lamp with an internal coil, were successfully simulated with the COMSOL Multiphysics software coupled with a fluid model. The rate coefficients of the main reactions involved in the production of VUV radiations from Kr-He plasma were summarized and input in the model. The concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
), which are main VUV-generation species, were set as output to evaluate the overall light intensity of the VUV lamp. As a result, the optimal designing parameters (the length and density of the coil and the radius of the lamp) as well as operating parameters (the input power, the pressure inside the lamp, and the mixing ratio of Kr to He) were obtained for the maximum light intensity. The reliability of the model was further verified by comparing the measured photon flux with the simulated concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
) as functions of the pressure and mixing ratio of Kr-He mixture, which showed good agreements in variation tends. The model provides a great convenience for the development of ICP based VUV lamp with high light intensity and stability.</description><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Classical Mechanics</subject><subject>Coils</subject><subject>Discharge lamps</subject><subject>Helium plasma</subject><subject>Inductively coupled plasma</subject><subject>Inorganic Chemistry</subject><subject>Light</subject><subject>Light sources</subject><subject>Low pressure</subject><subject>Luminous intensity</subject><subject>Mathematical models</subject><subject>Mechanical Engineering</subject><subject>Mixing ratio</subject><subject>Mixtures</subject><subject>Original Paper</subject><subject>Parameters</subject><subject>Plasma jets</subject><subject>Simulation</subject><issn>0272-4324</issn><issn>1572-8986</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp9kEtPwzAQhC0EEqXwBzhZ4mxY22keRyiPVgSBBO3VMo7dGuWFnQDtr8clSNw47e5oZlb6EDqlcE4BkgtPKWRAgHFCgacx2e6hEZ0kjKRZGu-jEbCwR5xFh-jI-zeAEOPJCPXPtupL2dmmxo3BuV2tOzyvO11722120nKxxLmsWnwlvS5w8M3roled_dDlBk-bvi2D_FRKX0l8bb1aS7fS2NY4bz5J67T3vdP43pGZxg_2qwvXMTowsvT65HeO0eL25mU6I_nj3Xx6mRPFEuiIMopxUMwUJqOUTQpFs0mkpYkV15JmaQFURVymnL4aFqVUxlozDVFasCIzwMfobOhtXfPea9-Jt6Z3dXgpWEZj4BnQOLjY4FKu8d5pI1pnK-k2goLY4RUDXhHwih-8YhtCfAj5YK5X2v1V_5P6BtGRfpE</recordid><startdate>2024</startdate><enddate>2024</enddate><creator>Yan, Zitao</creator><creator>Yu, Zhangqi</creator><creator>Wei, Zhiyang</creator><creator>Yang, Bo</creator><creator>Shu, Jinian</creator><creator>Sun, Haohang</creator><creator>Li, Zhen</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2024</creationdate><title>Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture</title><author>Yan, Zitao ; Yu, Zhangqi ; Wei, Zhiyang ; Yang, Bo ; Shu, Jinian ; Sun, Haohang ; Li, Zhen</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c270t-cfc230c2fdf91125dc1954eaf6c3ea198d01c43a831bf2481a6ee2e048d2d9f03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Classical Mechanics</topic><topic>Coils</topic><topic>Discharge lamps</topic><topic>Helium plasma</topic><topic>Inductively coupled plasma</topic><topic>Inorganic Chemistry</topic><topic>Light</topic><topic>Light sources</topic><topic>Low pressure</topic><topic>Luminous intensity</topic><topic>Mathematical models</topic><topic>Mechanical Engineering</topic><topic>Mixing ratio</topic><topic>Mixtures</topic><topic>Original Paper</topic><topic>Parameters</topic><topic>Plasma jets</topic><topic>Simulation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yan, Zitao</creatorcontrib><creatorcontrib>Yu, Zhangqi</creatorcontrib><creatorcontrib>Wei, Zhiyang</creatorcontrib><creatorcontrib>Yang, Bo</creatorcontrib><creatorcontrib>Shu, Jinian</creatorcontrib><creatorcontrib>Sun, Haohang</creatorcontrib><creatorcontrib>Li, Zhen</creatorcontrib><collection>CrossRef</collection><jtitle>Plasma chemistry and plasma processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yan, Zitao</au><au>Yu, Zhangqi</au><au>Wei, Zhiyang</au><au>Yang, Bo</au><au>Shu, Jinian</au><au>Sun, Haohang</au><au>Li, Zhen</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture</atitle><jtitle>Plasma chemistry and plasma processing</jtitle><stitle>Plasma Chem Plasma Process</stitle><date>2024</date><risdate>2024</risdate><volume>44</volume><issue>1</issue><spage>547</spage><epage>563</epage><pages>547-563</pages><issn>0272-4324</issn><eissn>1572-8986</eissn><abstract>The vacuum ultraviolet (VUV) light source derived from the Kr-He discharge is widely used for organic analysis, however the relevant model that greatly facilitates the design of high-performance VUV light sources remains to be developed. This study explores a model for simulating the light intensity of the VUV lamps based on the inductively coupled plasma (ICP) discharge in the low-pressure Kr-He mixture. Two typical ICP based light sources, i.e., a 13.56 MHz VUV lamp with an external coil and a 2.65 MHz VUV lamp with an internal coil, were successfully simulated with the COMSOL Multiphysics software coupled with a fluid model. The rate coefficients of the main reactions involved in the production of VUV radiations from Kr-He plasma were summarized and input in the model. The concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
), which are main VUV-generation species, were set as output to evaluate the overall light intensity of the VUV lamp. As a result, the optimal designing parameters (the length and density of the coil and the radius of the lamp) as well as operating parameters (the input power, the pressure inside the lamp, and the mixing ratio of Kr to He) were obtained for the maximum light intensity. The reliability of the model was further verified by comparing the measured photon flux with the simulated concentrations of Kr
*
(
3
P
1
) and Kr
*
(
1
P
1
) as functions of the pressure and mixing ratio of Kr-He mixture, which showed good agreements in variation tends. The model provides a great convenience for the development of ICP based VUV lamp with high light intensity and stability.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11090-023-10386-z</doi><tpages>17</tpages></addata></record> |
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| subjects | Characterization and Evaluation of Materials Chemistry Chemistry and Materials Science Classical Mechanics Coils Discharge lamps Helium plasma Inductively coupled plasma Inorganic Chemistry Light Light sources Low pressure Luminous intensity Mathematical models Mechanical Engineering Mixing ratio Mixtures Original Paper Parameters Plasma jets Simulation |
| title | Simulation of Light Intensity of VUV Lamp Based on Inductively Coupled Plasma Discharge in Low-pressure Kr-He Mixture |
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