Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects
Sputter deposition of ultrathick ( ≈ 20 μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication of hohlraums for magnetically assisted inertial confinement fusion. Here, we study the deposition of AuTa 4 alloy coatings onto rotating substrates. We use high-power impulse...
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| creator | Shin, S. J. Bae, J. H. Engwall, A. M. Bayu Aji, L. B. Baker, A. A. Taylor, G. V. Merlo, J. B. Sohngen, L. R. Moody, J. D. Kucheyev, S. O. |
| description | Sputter deposition of ultrathick (
≈
20
μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication of hohlraums for magnetically assisted inertial confinement fusion. Here, we study the deposition of AuTa
4 alloy coatings onto rotating substrates. We use high-power impulse magnetron sputtering (HiPIMS) in a constant peak target voltage mode. Results show that the target erosion state has a strong impact on the dominant crystallographic phase, microstructure, surface morphology, and electrical resistivity of AuTa
4 films. This is due to effects of changes in the confining magnetic field with target erosion on the HiPIMS discharge characteristics and the sputter source output. We quantify these effects via plasma diagnostics and discuss the optimization of HiPIMS deposition of ultrathick films for cases when target erosion effects dominate film properties. |
| doi_str_mv | 10.1063/5.0186803 |
| format | Article |
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≈
20
μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication of hohlraums for magnetically assisted inertial confinement fusion. Here, we study the deposition of AuTa
4 alloy coatings onto rotating substrates. We use high-power impulse magnetron sputtering (HiPIMS) in a constant peak target voltage mode. Results show that the target erosion state has a strong impact on the dominant crystallographic phase, microstructure, surface morphology, and electrical resistivity of AuTa
4 films. This is due to effects of changes in the confining magnetic field with target erosion on the HiPIMS discharge characteristics and the sputter source output. We quantify these effects via plasma diagnostics and discuss the optimization of HiPIMS deposition of ultrathick films for cases when target erosion effects dominate film properties.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/5.0186803</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Applied physics ; Coatings ; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ; Crystallography ; Deposition ; Heavy metal alloys ; Hohlraums ; Inertial confinement fusion ; Magnetron sputtering ; MATERIALS SCIENCE ; Plasma diagnostics ; Rotation ; sputter deposition ; Substrates</subject><ispartof>Journal of applied physics, 2024-01, Vol.135 (3)</ispartof><rights>Author(s)</rights><rights>2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c314t-e6cdf68a12b6e4c14600a1d48eee207f0e4963271793a7c896754d14e421bfc43</cites><orcidid>0000-0001-8330-1260 ; 0000-0001-5608-9217 ; 0000-0003-1557-3023 ; 0009-0000-9250-2072 ; 0000-0003-3132-0122 ; 0009-0000-6602-6084 ; 0000-0001-8502-106X ; 0000-0003-0700-0858 ; 0009000092502072 ; 0000000307000858 ; 0000000183301260 ; 000000018502106X ; 0000000315573023 ; 0009000066026084 ; 0000000156089217 ; 0000000331320122</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/2281794$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Shin, S. J.</creatorcontrib><creatorcontrib>Bae, J. H.</creatorcontrib><creatorcontrib>Engwall, A. M.</creatorcontrib><creatorcontrib>Bayu Aji, L. B.</creatorcontrib><creatorcontrib>Baker, A. A.</creatorcontrib><creatorcontrib>Taylor, G. V.</creatorcontrib><creatorcontrib>Merlo, J. B.</creatorcontrib><creatorcontrib>Sohngen, L. R.</creatorcontrib><creatorcontrib>Moody, J. D.</creatorcontrib><creatorcontrib>Kucheyev, S. O.</creatorcontrib><creatorcontrib>Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)</creatorcontrib><title>Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects</title><title>Journal of applied physics</title><description>Sputter deposition of ultrathick (
≈
20
μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication of hohlraums for magnetically assisted inertial confinement fusion. Here, we study the deposition of AuTa
4 alloy coatings onto rotating substrates. We use high-power impulse magnetron sputtering (HiPIMS) in a constant peak target voltage mode. Results show that the target erosion state has a strong impact on the dominant crystallographic phase, microstructure, surface morphology, and electrical resistivity of AuTa
4 films. This is due to effects of changes in the confining magnetic field with target erosion on the HiPIMS discharge characteristics and the sputter source output. We quantify these effects via plasma diagnostics and discuss the optimization of HiPIMS deposition of ultrathick films for cases when target erosion effects dominate film properties.</description><subject>Applied physics</subject><subject>Coatings</subject><subject>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</subject><subject>Crystallography</subject><subject>Deposition</subject><subject>Heavy metal alloys</subject><subject>Hohlraums</subject><subject>Inertial confinement fusion</subject><subject>Magnetron sputtering</subject><subject>MATERIALS SCIENCE</subject><subject>Plasma diagnostics</subject><subject>Rotation</subject><subject>sputter deposition</subject><subject>Substrates</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp90c1OxCAQB3BiNHH9OPgGRE-aVIHSAt7M-pmYeNEzYdnpFu2WClSzD-B7S7OePXHg92dmGIROKLmkpC6vqktCZS1JuYNmlEhViKoiu2hGCKOFVELto4MY3wmhVJZqhn5uYfDRJed77Bs8dimY1Dr7gVswX5tiDcl02HSd30ScTfDJJNevcBwXcbIQ8WKDW7dqi8F_Q8BuPYxdBLw2qx5SyJk4jClByKlr_GrCChKGkIvmK2gasCkeob3G5NDx33mI3u7vXuePxfPLw9P85rmwJeWpgNoum1oayhY1cEt5TYihSy4BgBHREOCqLpmgQpVGWKlqUfEl5cAZXTSWl4fodPuuj8npaF0C21rf97kJzZjMwQmdbdEQ_OcIMel3P4Y-96WZopUoFRNVVudbZfMoMUCjh-DWJmw0JXpaha703yqyvdjaqaKZ_vof_AvB8oq7</recordid><startdate>20240121</startdate><enddate>20240121</enddate><creator>Shin, S. 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J. ; Bae, J. H. ; Engwall, A. M. ; Bayu Aji, L. B. ; Baker, A. A. ; Taylor, G. V. ; Merlo, J. B. ; Sohngen, L. R. ; Moody, J. D. ; Kucheyev, S. O.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c314t-e6cdf68a12b6e4c14600a1d48eee207f0e4963271793a7c896754d14e421bfc43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Applied physics</topic><topic>Coatings</topic><topic>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</topic><topic>Crystallography</topic><topic>Deposition</topic><topic>Heavy metal alloys</topic><topic>Hohlraums</topic><topic>Inertial confinement fusion</topic><topic>Magnetron sputtering</topic><topic>MATERIALS SCIENCE</topic><topic>Plasma diagnostics</topic><topic>Rotation</topic><topic>sputter deposition</topic><topic>Substrates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shin, S. J.</creatorcontrib><creatorcontrib>Bae, J. H.</creatorcontrib><creatorcontrib>Engwall, A. M.</creatorcontrib><creatorcontrib>Bayu Aji, L. B.</creatorcontrib><creatorcontrib>Baker, A. A.</creatorcontrib><creatorcontrib>Taylor, G. V.</creatorcontrib><creatorcontrib>Merlo, J. B.</creatorcontrib><creatorcontrib>Sohngen, L. R.</creatorcontrib><creatorcontrib>Moody, J. D.</creatorcontrib><creatorcontrib>Kucheyev, S. O.</creatorcontrib><creatorcontrib>Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)</creatorcontrib><collection>AIP Open Access Journals</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shin, S. J.</au><au>Bae, J. H.</au><au>Engwall, A. M.</au><au>Bayu Aji, L. B.</au><au>Baker, A. A.</au><au>Taylor, G. V.</au><au>Merlo, J. B.</au><au>Sohngen, L. R.</au><au>Moody, J. D.</au><au>Kucheyev, S. O.</au><aucorp>Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects</atitle><jtitle>Journal of applied physics</jtitle><date>2024-01-21</date><risdate>2024</risdate><volume>135</volume><issue>3</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>Sputter deposition of ultrathick (
≈
20
μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication of hohlraums for magnetically assisted inertial confinement fusion. Here, we study the deposition of AuTa
4 alloy coatings onto rotating substrates. We use high-power impulse magnetron sputtering (HiPIMS) in a constant peak target voltage mode. Results show that the target erosion state has a strong impact on the dominant crystallographic phase, microstructure, surface morphology, and electrical resistivity of AuTa
4 films. This is due to effects of changes in the confining magnetic field with target erosion on the HiPIMS discharge characteristics and the sputter source output. We quantify these effects via plasma diagnostics and discuss the optimization of HiPIMS deposition of ultrathick films for cases when target erosion effects dominate film properties.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/5.0186803</doi><tpages>14</tpages><orcidid>https://orcid.org/0000-0001-8330-1260</orcidid><orcidid>https://orcid.org/0000-0001-5608-9217</orcidid><orcidid>https://orcid.org/0000-0003-1557-3023</orcidid><orcidid>https://orcid.org/0009-0000-9250-2072</orcidid><orcidid>https://orcid.org/0000-0003-3132-0122</orcidid><orcidid>https://orcid.org/0009-0000-6602-6084</orcidid><orcidid>https://orcid.org/0000-0001-8502-106X</orcidid><orcidid>https://orcid.org/0000-0003-0700-0858</orcidid><orcidid>https://orcid.org/0009000092502072</orcidid><orcidid>https://orcid.org/0000000307000858</orcidid><orcidid>https://orcid.org/0000000183301260</orcidid><orcidid>https://orcid.org/000000018502106X</orcidid><orcidid>https://orcid.org/0000000315573023</orcidid><orcidid>https://orcid.org/0009000066026084</orcidid><orcidid>https://orcid.org/0000000156089217</orcidid><orcidid>https://orcid.org/0000000331320122</orcidid><oa>free_for_read</oa></addata></record> |
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| ispartof | Journal of applied physics, 2024-01, Vol.135 (3) |
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| source | Alma/SFX Local Collection |
| subjects | Applied physics Coatings CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY Crystallography Deposition Heavy metal alloys Hohlraums Inertial confinement fusion Magnetron sputtering MATERIALS SCIENCE Plasma diagnostics Rotation sputter deposition Substrates |
| title | Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects |
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