Experimental In-Situ Observatory on Brownian Motion Behavior of 105 nm Sized Silica Particles During Chemical Mechanical Polishing of 4H-SiC by an Evanescent Field

The experimentally observing optical systems for on-machine measurement have been developed to study on nano-polishing phenomena during the chemical mechanical polishing process, which is a wet process in semiconductor manufacturing. The developed optical system employs an evanescent field to select...

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Veröffentlicht in:	International journal of automation technology 2024-01, Vol.18 (1), p.47-57
Hauptverfasser:	Permpatdechakul, Thitipat, Khajornrungruang, Panart, Suzuki, Keisuke, Blattler, Aran, Inthiam, Jiraphan
Format:	Artikel
Sprache:	eng
Schlagworte:	Brownian motion Chemical-mechanical polishing Hard materials Nanoparticles Numerical aperture Observatories Reagents Resolution Silica glass Silicon carbide Sliding Substrates
Online-Zugang:	Volltext
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