Growth of Aluminum Molybdenum Oxide Films by Atomic Layer Deposition with Using Trimethylaluminum, Molybdenum Oxytetrachloride, and Water

— In this paper, we report on the growth of aluminum molybdenum oxide (Al x Mo y O z ) films via atomic layer deposition (ALD) with the use of trimethylaluminum (TMA) (Al(CH 3 ) 3 ), molybdenum oxytetrachloride (MoOCl 4 ), and water. The film growth process was studied in situ using a quartz crystal...

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Veröffentlicht in:	Inorganic materials 2023-04, Vol.59 (4), p.369-378
Hauptverfasser:	Maksumova, A. M., Bodalev, I. S., Suleimanov, S. I., Alikhanov, N. M.-R., Abdulagatov, I. M., Rabadanov, M. Kh, Abdulagatov, A. I.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Atomic layer epitaxy Chemistry Chemistry and Materials Science Film growth Industrial Chemistry/Chemical Engineering Inorganic Chemistry Materials Science Molybdenum Molybdenum oxides Oxidation Oxide coatings Quartz crystals Surface roughness Valence
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