Analysis of Single Event Response and Hardening Methods in 1.2 kV SiC Power MOSFET With Multicell and Termination Structure
In this article, the single event response and hardening methods of 1.2 kV silicon carbide (SiC) power MOSFET with multicell and field limiting rings (FLRs) termination structure are investigated by using numerical simulations. Our studies reveal that the termination region is insensitive to single-...
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Veröffentlicht in: | IEEE transactions on electron devices 2023-12, Vol.70 (12), p.6459-6464 |
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description | In this article, the single event response and hardening methods of 1.2 kV silicon carbide (SiC) power MOSFET with multicell and field limiting rings (FLRs) termination structure are investigated by using numerical simulations. Our studies reveal that the termination region is insensitive to single-event burnout (SEB) due to the floating state (no grounded contact hole). It can be found that the electric potential difference along the penetrating path is small. Thus, the Kirk effect could not occur. Conversely, at the cell region, the whole area is connected with the source contact hole, the Kirk effect happens unavoidably if the high bias voltage is applied, leading to a continuous current generation with a local hot spot. Meanwhile, it can be found that the intersection of the cell and termination region is the most sensitive area when the strike position is near the contact hole. In this situation, the huge carriers are generated by the avalanche multiplication behavior like in the cell region. Then, the current will flow along the surface region, resulting in a continual current generation with a local temperature rising. Furthermore, a new hardening technique with a shortened metal plate is proposed. Simulation results indicate that the new structure can alleviate the current accumulation at the intersection region, bringing a better SEB tolerance. |
doi_str_mv | 10.1109/TED.2023.3321278 |
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Our studies reveal that the termination region is insensitive to single-event burnout (SEB) due to the floating state (no grounded contact hole). It can be found that the electric potential difference along the penetrating path is small. Thus, the Kirk effect could not occur. Conversely, at the cell region, the whole area is connected with the source contact hole, the Kirk effect happens unavoidably if the high bias voltage is applied, leading to a continuous current generation with a local hot spot. Meanwhile, it can be found that the intersection of the cell and termination region is the most sensitive area when the strike position is near the contact hole. In this situation, the huge carriers are generated by the avalanche multiplication behavior like in the cell region. Then, the current will flow along the surface region, resulting in a continual current generation with a local temperature rising. Furthermore, a new hardening technique with a shortened metal plate is proposed. Simulation results indicate that the new structure can alleviate the current accumulation at the intersection region, bringing a better SEB tolerance.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2023.3321278</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Contact holes ; Electric contacts ; Electric field ; Electric fields ; field limiting rings (FLRs) ; Hardening ; Ions ; Junctions ; Kirk effect ; Metal plates ; MOSFET ; MOSFETs ; multicell ; Semiconductor process modeling ; Silicon carbide ; silicon carbide (SiC) power MOSFET ; single event burnout (SEB) ; termination ; Transient analysis</subject><ispartof>IEEE transactions on electron devices, 2023-12, Vol.70 (12), p.6459-6464</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2023</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c245t-6a6b08ca4a810a4df69b2760ab09fedc225ac63e3be393dd703bdf5bc06e27ad3</cites><orcidid>0000-0003-4905-2744 ; 0000-0002-2573-3660</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10274822$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10274822$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Lu, Jiang</creatorcontrib><creatorcontrib>Song, Wenjun</creatorcontrib><creatorcontrib>Liu, Tao</creatorcontrib><creatorcontrib>Tang, Jun</creatorcontrib><creatorcontrib>Zhao, Wen</creatorcontrib><creatorcontrib>Li, Duoli</creatorcontrib><creatorcontrib>Li, Bo</creatorcontrib><title>Analysis of Single Event Response and Hardening Methods in 1.2 kV SiC Power MOSFET With Multicell and Termination Structure</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>In this article, the single event response and hardening methods of 1.2 kV silicon carbide (SiC) power MOSFET with multicell and field limiting rings (FLRs) termination structure are investigated by using numerical simulations. Our studies reveal that the termination region is insensitive to single-event burnout (SEB) due to the floating state (no grounded contact hole). It can be found that the electric potential difference along the penetrating path is small. Thus, the Kirk effect could not occur. Conversely, at the cell region, the whole area is connected with the source contact hole, the Kirk effect happens unavoidably if the high bias voltage is applied, leading to a continuous current generation with a local hot spot. Meanwhile, it can be found that the intersection of the cell and termination region is the most sensitive area when the strike position is near the contact hole. In this situation, the huge carriers are generated by the avalanche multiplication behavior like in the cell region. Then, the current will flow along the surface region, resulting in a continual current generation with a local temperature rising. Furthermore, a new hardening technique with a shortened metal plate is proposed. Simulation results indicate that the new structure can alleviate the current accumulation at the intersection region, bringing a better SEB tolerance.</description><subject>Contact holes</subject><subject>Electric contacts</subject><subject>Electric field</subject><subject>Electric fields</subject><subject>field limiting rings (FLRs)</subject><subject>Hardening</subject><subject>Ions</subject><subject>Junctions</subject><subject>Kirk effect</subject><subject>Metal plates</subject><subject>MOSFET</subject><subject>MOSFETs</subject><subject>multicell</subject><subject>Semiconductor process modeling</subject><subject>Silicon carbide</subject><subject>silicon carbide (SiC) power MOSFET</subject><subject>single event burnout (SEB)</subject><subject>termination</subject><subject>Transient analysis</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpNkD1PwzAQhi0EEqWwMzBYYk7xR-LEY1UKRWpVRAuMkRNfqEvqFNsBVfx5UsrAdHp173PSPQhdUjKglMib5fh2wAjjA84ZZWl2hHo0SdJIilgcox4hNIskz_gpOvN-3UURx6yHvodW1TtvPG4qvDD2rQY8_gQb8BP4bWM9YGU1niinwXZrPIOwarTHxmI6YPj9paNG-LH5Aodn88XdeIlfTVjhWVsHU0Jd__JLcBtjVTCNxYvg2jK0Ds7RSaVqDxd_s4-eO3w0iabz-4fRcBqVLE5CJJQoSFaqWGWUqFhXQhYsFUQVRFagS8YSVQoOvAAuudYp4YWukqIkAliqNO-j68PdrWs-WvAhXzet6_72OctkQkhCU9m1yKFVusZ7B1W-dWaj3C6nJN8rzjvF-V5x_qe4Q64OiAGAf3WWxhlj_AcetHe-</recordid><startdate>20231201</startdate><enddate>20231201</enddate><creator>Lu, Jiang</creator><creator>Song, Wenjun</creator><creator>Liu, Tao</creator><creator>Tang, Jun</creator><creator>Zhao, Wen</creator><creator>Li, Duoli</creator><creator>Li, Bo</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-4905-2744</orcidid><orcidid>https://orcid.org/0000-0002-2573-3660</orcidid></search><sort><creationdate>20231201</creationdate><title>Analysis of Single Event Response and Hardening Methods in 1.2 kV SiC Power MOSFET With Multicell and Termination Structure</title><author>Lu, Jiang ; Song, Wenjun ; Liu, Tao ; Tang, Jun ; Zhao, Wen ; Li, Duoli ; Li, Bo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c245t-6a6b08ca4a810a4df69b2760ab09fedc225ac63e3be393dd703bdf5bc06e27ad3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Contact holes</topic><topic>Electric contacts</topic><topic>Electric field</topic><topic>Electric fields</topic><topic>field limiting rings (FLRs)</topic><topic>Hardening</topic><topic>Ions</topic><topic>Junctions</topic><topic>Kirk effect</topic><topic>Metal plates</topic><topic>MOSFET</topic><topic>MOSFETs</topic><topic>multicell</topic><topic>Semiconductor process modeling</topic><topic>Silicon carbide</topic><topic>silicon carbide (SiC) power MOSFET</topic><topic>single event burnout (SEB)</topic><topic>termination</topic><topic>Transient analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lu, Jiang</creatorcontrib><creatorcontrib>Song, Wenjun</creatorcontrib><creatorcontrib>Liu, Tao</creatorcontrib><creatorcontrib>Tang, Jun</creatorcontrib><creatorcontrib>Zhao, Wen</creatorcontrib><creatorcontrib>Li, Duoli</creatorcontrib><creatorcontrib>Li, Bo</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Lu, Jiang</au><au>Song, Wenjun</au><au>Liu, Tao</au><au>Tang, Jun</au><au>Zhao, Wen</au><au>Li, Duoli</au><au>Li, Bo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analysis of Single Event Response and Hardening Methods in 1.2 kV SiC Power MOSFET With Multicell and Termination Structure</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2023-12-01</date><risdate>2023</risdate><volume>70</volume><issue>12</issue><spage>6459</spage><epage>6464</epage><pages>6459-6464</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>In this article, the single event response and hardening methods of 1.2 kV silicon carbide (SiC) power MOSFET with multicell and field limiting rings (FLRs) termination structure are investigated by using numerical simulations. Our studies reveal that the termination region is insensitive to single-event burnout (SEB) due to the floating state (no grounded contact hole). It can be found that the electric potential difference along the penetrating path is small. Thus, the Kirk effect could not occur. Conversely, at the cell region, the whole area is connected with the source contact hole, the Kirk effect happens unavoidably if the high bias voltage is applied, leading to a continuous current generation with a local hot spot. Meanwhile, it can be found that the intersection of the cell and termination region is the most sensitive area when the strike position is near the contact hole. In this situation, the huge carriers are generated by the avalanche multiplication behavior like in the cell region. Then, the current will flow along the surface region, resulting in a continual current generation with a local temperature rising. Furthermore, a new hardening technique with a shortened metal plate is proposed. Simulation results indicate that the new structure can alleviate the current accumulation at the intersection region, bringing a better SEB tolerance.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TED.2023.3321278</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0003-4905-2744</orcidid><orcidid>https://orcid.org/0000-0002-2573-3660</orcidid></addata></record> |
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subjects | Contact holes Electric contacts Electric field Electric fields field limiting rings (FLRs) Hardening Ions Junctions Kirk effect Metal plates MOSFET MOSFETs multicell Semiconductor process modeling Silicon carbide silicon carbide (SiC) power MOSFET single event burnout (SEB) termination Transient analysis |
title | Analysis of Single Event Response and Hardening Methods in 1.2 kV SiC Power MOSFET With Multicell and Termination Structure |
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