Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range

Variants of the structures of free-standing films with a high transmittance coefficient at a wavelength of 13.5 nm, which were developed for use in the projection of extreme ultraviolet (EUV) lithography as protective and filtering elements, are considered. Our attention is focused on the most probl...

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Bibliographische Detailangaben

Veröffentlicht in:	Russian microelectronics 2023-10, Vol.52 (5), p.344-355
Hauptverfasser:	Zuev, S. Yu, Lopatin, A. Ya, Luchin, V. I., Salashchenko, N. N., Tsybin, N. N., Chkhalo, N. I.
Format:	Artikel
Sprache:	eng
Schlagworte:	Electrical Engineering Engineering Lithography Transmittance
Online-Zugang:	Volltext
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