Fabrication of CoFeB–SiO2 Films With Large Uniaxial Anisotropy by Facing Target Sputtering and its Application to High-Frequency Planar-Type Spiral Inductors

A comprehensive study on fabrication of CoFeB–SiO2 films with large in-plane magnetic anisotropy for the use in high-frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering (FTS), which can introduce large uniaxial magnetic an...

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Veröffentlicht in:IEEE transactions on magnetics 2023-07, Vol.59 (11), p.1
Hauptverfasser: Takamura, Yota, Nitta, Honami, Kawahara, Kazuma, Kaneko, Tadayuki, Ishido, Ryosuke, Miyazaki, Tatsuya, Hosoda, Naoki, Fujisaki, Keisuke, Nakagawa, Shigeki
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container_issue 11
container_start_page 1
container_title IEEE transactions on magnetics
container_volume 59
creator Takamura, Yota
Nitta, Honami
Kawahara, Kazuma
Kaneko, Tadayuki
Ishido, Ryosuke
Miyazaki, Tatsuya
Hosoda, Naoki
Fujisaki, Keisuke
Nakagawa, Shigeki
description A comprehensive study on fabrication of CoFeB–SiO2 films with large in-plane magnetic anisotropy for the use in high-frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering (FTS), which can introduce large uniaxial magnetic anisotropy in the plane. A multilayer structure consisting of CoFeB–SiO2 and SiO2 layers suppressed columnar growth and thus reduced undesired perpendicular magnetic anisotropy (PMA). As a result, a [Formula Omitted]-thick magnetic layer was achieved with excellent soft-magnetic properties and no stripe domain structure. The effectiveness of these magnetic films was demonstrated by fabricating and characterizing planar-type spiral coils. This development of micromagnetic inductors using the magnetic layer shows great potential for use in high-frequency power electronics applications.
doi_str_mv 10.1109/TMAG.2023.3291879
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1941-0069
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subjects Columnar structure
Electronics
Inductors
Magnetic anisotropy
Magnetic films
Magnetic properties
Magnetism
Multilayers
Silicon dioxide
Sputtering
title Fabrication of CoFeB–SiO2 Films With Large Uniaxial Anisotropy by Facing Target Sputtering and its Application to High-Frequency Planar-Type Spiral Inductors
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