Physical Wet Cleaning Technology for Semiconductor Devices

In the semiconductor device manufacturing process, wet cleaning is an important process that determines product yield. In this paper, spray cleaning in the wet process of semiconductor device manufacturing is described from the perspective of macroscopic fluid dynamics. When micrometer-order particl...

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Veröffentlicht in:	JAPANESE JOURNAL OF MULTIPHASE FLOW 2023/06/15, Vol.37(2), pp.189-196
1. Verfasser:	SEIKE, Yoshiyuki
Format:	Artikel
Sprache:	eng ; jpn
Schlagworte:	Cleaning Damage patterns Drag Drag force Fluid dynamics Manufacturing Semiconductor Semiconductor devices Spray Spraying Substrates Ultrasonic Van der Waals forces
Online-Zugang:	Volltext
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