Effect of Magnetron Sputtering Power on ITO Film Deposition at Room Temperature

Magnetron sputtering in the medium frequency (MF) mode was used to obtain ITO films on glass substrates at room temperature in an oxygen-free environment. The effect of the magnetron sputtering power on the electrophysical properties and surface morphology of ITO films is studied. It is shown that t...

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Veröffentlicht in:	Russian microelectronics 2023-08, Vol.52 (4), p.297-302
Hauptverfasser:	Saenko, A. V., Vakulov, Z. E., Klimin, V. S., Bilyk, G. E., Malyukov, S. P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Current carriers Deposition Electrical Engineering Engineering Glass substrates Grain size Magnetic properties Magnetron sputtering Oxidation Photovoltaic cells Room temperature Solar cells Surface resistance Surface roughness
Online-Zugang:	Volltext
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