Comparative X-ray Diffractometry of the Defect Structure of ZnO Epitaxial Films Deposited by Magnetron Sputtering on C-Plane Al2O3 Substrates in Inhomogeneous Electric Field

The results of studying the specific features of the growth of zinc oxide films formed on sapphire substrates by magnetron sputtering in an inhomogeneous electric field are presented. The films have been analyzed by high-resolution X-ray diffractometry, pole figure technique, and electron microscopy...

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Veröffentlicht in:	Crystallography reports 2023-04, Vol.68 (2), p.195-202
Hauptverfasser:	Volkovsky, Yu. A., Zhernova, V. A., Folomeshkin, M. S., Prosekov, P. A., Muslimov, A. E., Butashin, A. V., Ismailov, A. M., Grigoriev, Yu. V., Pisarevsky, Yu. V., Kanevsky, V. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum oxide Crystallography and Scattering Methods Diffraction and Scattering of Ionizing Radiations Film thickness Inhomogeneous electric fields Magnetron sputtering Oxide coatings Physics Physics and Astronomy Sapphire Substrates Zinc oxide
Online-Zugang:	Volltext
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