Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

This study investigates the structural and optical characteristics of aluminum nitride (AlN) thin films deposited using reactive magnetron sputtering (dcMS)in an Ar + N 2 (80:20%) atmosphere. The AlN thin films were deposited on a substrate without any heat treatment process, and their structural pr...

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Veröffentlicht in:	Journal of materials science. Materials in electronics 2023-05, Vol.34 (13), p.1088, Article 1088
Hauptverfasser:	Alyousef, Haifa A., Hassan, A. M., Zakaly, Hesham M. H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorptivity Aluminum nitride Characterization and Evaluation of Materials Chemistry and Materials Science Heat treatment Magnetron sputtering Materials Science Mathematical analysis Nonlinear optics Optical and Electronic Materials Optical properties Preferred orientation Refractivity Substrates Thin films Transmittance Visible spectrum Wurtzite
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