Investigating the Reliability of a Negative Capacitance Field Effect Transistor Regarding the Electric Field Across the Oxide Layer

The observation of room temperature sub-60 mV/dec subthreshold slope in MOSFET with ferroelectric layers in the gate stacks has attracted much attention. However, little consideration is given to reliability, which affects the long-term stability of the device. In this work, we investigate the relia...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of electronic materials 2023-05, Vol.52 (5), p.3180-3187
Hauptverfasser: Liu, Bingtao, Sun, Hanxi, Huan, Changmeng, Jia, Renxu, Cai, Yongqing, Ke, Qingqing
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!