Electrically Driven Sub‐Micrometer Light‐Emitting Diode Arrays Using Maskless and Etching‐Free Pixelation (Adv. Mater. 13/2023)
Micro‐Light‐Emitting‐Diodes Conventional methods of pixelating micro‐light‐emitting‐diodes (micro‐LEDs) via dry‐etching present many drawbacks due to induced structural damage. In article 2206945, Yong‐Hoon Cho and co‐workers report a simple pixelation methodology for micro‐light‐emitting diodes tha...
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| Veröffentlicht in: | Advanced materials (Weinheim) 2023-03, Vol.35 (13), p.n/a |
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| container_title | Advanced materials (Weinheim) |
| container_volume | 35 |
| creator | Moon, Ji‐Hwan Kim, Baul Choi, Minho Woo, Kie Young Kim, Byung Su Ahn, Seonghun Jun, Seongmoon Song, Yong‐Ho Cho, Yong‐Hoon |
| description | Micro‐Light‐Emitting‐Diodes
Conventional methods of pixelating micro‐light‐emitting‐diodes (micro‐LEDs) via dry‐etching present many drawbacks due to induced structural damage. In article 2206945, Yong‐Hoon Cho and co‐workers report a simple pixelation methodology for micro‐light‐emitting diodes that can be scaled down to the sub‐micrometer scale using a tailored focused ion beam irradiation technique. Electrically driven sub‐micrometer‐sized pixels are successfully demonstrated without any structural deformation, enabling high‐pixel‐density displays for future applications. |
| doi_str_mv | 10.1002/adma.202370090 |
| format | Article |
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Conventional methods of pixelating micro‐light‐emitting‐diodes (micro‐LEDs) via dry‐etching present many drawbacks due to induced structural damage. In article 2206945, Yong‐Hoon Cho and co‐workers report a simple pixelation methodology for micro‐light‐emitting diodes that can be scaled down to the sub‐micrometer scale using a tailored focused ion beam irradiation technique. Electrically driven sub‐micrometer‐sized pixels are successfully demonstrated without any structural deformation, enabling high‐pixel‐density displays for future applications.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.202370090</identifier><language>eng</language><publisher>Weinheim: Wiley Subscription Services, Inc</publisher><subject>electrically driven devices ; Etching ; focused ion beams ; Ion beams ; Light emitting diodes ; luminescence quenching and electrical isolation ; maskless and etching‐free pixelation ; Materials science ; Pixels ; Structural damage ; sub‐micrometer light‐emitting diodes</subject><ispartof>Advanced materials (Weinheim), 2023-03, Vol.35 (13), p.n/a</ispartof><rights>2023 Wiley‐VCH GmbH</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fadma.202370090$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fadma.202370090$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><creatorcontrib>Moon, Ji‐Hwan</creatorcontrib><creatorcontrib>Kim, Baul</creatorcontrib><creatorcontrib>Choi, Minho</creatorcontrib><creatorcontrib>Woo, Kie Young</creatorcontrib><creatorcontrib>Kim, Byung Su</creatorcontrib><creatorcontrib>Ahn, Seonghun</creatorcontrib><creatorcontrib>Jun, Seongmoon</creatorcontrib><creatorcontrib>Song, Yong‐Ho</creatorcontrib><creatorcontrib>Cho, Yong‐Hoon</creatorcontrib><title>Electrically Driven Sub‐Micrometer Light‐Emitting Diode Arrays Using Maskless and Etching‐Free Pixelation (Adv. Mater. 13/2023)</title><title>Advanced materials (Weinheim)</title><description>Micro‐Light‐Emitting‐Diodes
Conventional methods of pixelating micro‐light‐emitting‐diodes (micro‐LEDs) via dry‐etching present many drawbacks due to induced structural damage. In article 2206945, Yong‐Hoon Cho and co‐workers report a simple pixelation methodology for micro‐light‐emitting diodes that can be scaled down to the sub‐micrometer scale using a tailored focused ion beam irradiation technique. Electrically driven sub‐micrometer‐sized pixels are successfully demonstrated without any structural deformation, enabling high‐pixel‐density displays for future applications.</description><subject>electrically driven devices</subject><subject>Etching</subject><subject>focused ion beams</subject><subject>Ion beams</subject><subject>Light emitting diodes</subject><subject>luminescence quenching and electrical isolation</subject><subject>maskless and etching‐free pixelation</subject><subject>Materials science</subject><subject>Pixels</subject><subject>Structural damage</subject><subject>sub‐micrometer light‐emitting diodes</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNqFkDFPwzAQhS0EEqWwMltigSHhnMROPEa0BaRWIAFz5DoXcEmTYqeFbizs_EZ-Ca6KYGQ66el77-4eIccMQgYQnatyrsIIojgFkLBDeoxHLEhA8l3SAxnzQIok2ycHzs3AIwJEj3wMa9SdNVrV9ZoOrFlhQ--W06_3z4nRtp1jh5aOzeNT56Xh3HSdaR7pwLQl0txatXb0wW2kiXLPNTpHVVPSYaefvOgtI4tIb80b1qozbUNP83IVetjHhpTF55uDzw7JXqVqh0c_s08eRsP7i6tgfHN5fZGPA814CkGsUyYUB5bFYspVlaIAhWVSAs-UTDI-lTrhU1FJnkaoEuS6YhqzSmSgRJnFfXKyzV3Y9mWJritm7dI2fmURpZJlXCSceSrcUv5_5yxWxcKaubLrgkGxqbrYVF38Vu0Ncmt4NTWu_6GLfDDJ_7zfdQ2ErQ</recordid><startdate>20230301</startdate><enddate>20230301</enddate><creator>Moon, Ji‐Hwan</creator><creator>Kim, Baul</creator><creator>Choi, Minho</creator><creator>Woo, Kie Young</creator><creator>Kim, Byung Su</creator><creator>Ahn, Seonghun</creator><creator>Jun, Seongmoon</creator><creator>Song, Yong‐Ho</creator><creator>Cho, Yong‐Hoon</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20230301</creationdate><title>Electrically Driven Sub‐Micrometer Light‐Emitting Diode Arrays Using Maskless and Etching‐Free Pixelation (Adv. Mater. 13/2023)</title><author>Moon, Ji‐Hwan ; Kim, Baul ; Choi, Minho ; Woo, Kie Young ; Kim, Byung Su ; Ahn, Seonghun ; Jun, Seongmoon ; Song, Yong‐Ho ; Cho, Yong‐Hoon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1570-3c716a501836b5af7e60aed4d058a9485b9c45b6f9572ea4e5cf1ce8f680a6d83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>electrically driven devices</topic><topic>Etching</topic><topic>focused ion beams</topic><topic>Ion beams</topic><topic>Light emitting diodes</topic><topic>luminescence quenching and electrical isolation</topic><topic>maskless and etching‐free pixelation</topic><topic>Materials science</topic><topic>Pixels</topic><topic>Structural damage</topic><topic>sub‐micrometer light‐emitting diodes</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Moon, Ji‐Hwan</creatorcontrib><creatorcontrib>Kim, Baul</creatorcontrib><creatorcontrib>Choi, Minho</creatorcontrib><creatorcontrib>Woo, Kie Young</creatorcontrib><creatorcontrib>Kim, Byung Su</creatorcontrib><creatorcontrib>Ahn, Seonghun</creatorcontrib><creatorcontrib>Jun, Seongmoon</creatorcontrib><creatorcontrib>Song, Yong‐Ho</creatorcontrib><creatorcontrib>Cho, Yong‐Hoon</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Moon, Ji‐Hwan</au><au>Kim, Baul</au><au>Choi, Minho</au><au>Woo, Kie Young</au><au>Kim, Byung Su</au><au>Ahn, Seonghun</au><au>Jun, Seongmoon</au><au>Song, Yong‐Ho</au><au>Cho, Yong‐Hoon</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrically Driven Sub‐Micrometer Light‐Emitting Diode Arrays Using Maskless and Etching‐Free Pixelation (Adv. Mater. 13/2023)</atitle><jtitle>Advanced materials (Weinheim)</jtitle><date>2023-03-01</date><risdate>2023</risdate><volume>35</volume><issue>13</issue><epage>n/a</epage><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>Micro‐Light‐Emitting‐Diodes
Conventional methods of pixelating micro‐light‐emitting‐diodes (micro‐LEDs) via dry‐etching present many drawbacks due to induced structural damage. In article 2206945, Yong‐Hoon Cho and co‐workers report a simple pixelation methodology for micro‐light‐emitting diodes that can be scaled down to the sub‐micrometer scale using a tailored focused ion beam irradiation technique. Electrically driven sub‐micrometer‐sized pixels are successfully demonstrated without any structural deformation, enabling high‐pixel‐density displays for future applications.</abstract><cop>Weinheim</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/adma.202370090</doi><tpages>1</tpages><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| source | Wiley Online Library |
| subjects | electrically driven devices Etching focused ion beams Ion beams Light emitting diodes luminescence quenching and electrical isolation maskless and etching‐free pixelation Materials science Pixels Structural damage sub‐micrometer light‐emitting diodes |
| title | Electrically Driven Sub‐Micrometer Light‐Emitting Diode Arrays Using Maskless and Etching‐Free Pixelation (Adv. Mater. 13/2023) |
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