Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein refer...

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Veröffentlicht in:	SN applied sciences 2020-05, Vol.2 (5), p.865, Article 865
Hauptverfasser:	da Silva, F. C., Tunes, M. A., Edmondson, P. D., Lima, N. B., Sagás, J. C., Fontana, L. C., Schön, C. G.
Format:	Artikel
Sprache:	eng
Schlagworte:	4. Materials (general) Applied and Technical Physics Bias Chemistry/Food Science Deposition Earth Sciences Energy Engineering Environment Film thickness Geometry Magnetron sputtering Materials Science Nitrogen Photoelectron spectroscopy Photoelectrons Plasma Research Article Scanning electron microscopy Spectrum analysis Stainless steel Substrates Thin films Titanium nitride Transmission electron microscopy X-ray diffraction
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