Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy
The anodic dissolution of Cobalt in H 2 O 2 solution is investigated in the presence and absence of a complexing agent, oxalic acid, using various techniques including electrochemical impedance spectroscopy (EIS). Anodic polarization measurements of both the solutions show that active dissolution oc...
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| Veröffentlicht in: | Journal of solid state electrochemistry 2023-04, Vol.27 (4), p.895-909 |
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| container_title | Journal of solid state electrochemistry |
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| creator | Hazarika, Jenasree Talukdar, Anusuya Rajaraman, Prasanna Venkatesh |
| description | The anodic dissolution of Cobalt in H
2
O
2
solution is investigated in the presence and absence of a complexing agent, oxalic acid, using various techniques including electrochemical impedance spectroscopy (EIS). Anodic polarization measurements of both the solutions show that active dissolution occurs in the potential range of 0 to 600 mV w.r.t open circuit potential (OCP) and the addition of oxalic acid enhances the dissolution of Co by forming highly soluble Cobalt complexes. The mechanistic reaction pathway of Co dissolution at metal-solution interface is investigated by performing EIS measurements at various overpotentials under anodic conditions. EIS spectra exhibit two loops; capacitance (higher frequency) followed by inductance (lower frequency) at all the overpotentials and it was modeled by a multi-step mechanism with 3 intermediate adsorbed species. The dissolution via both chemical and electrochemical steps is considered in the proposed model. From the parameters obtained, dominance of
C
o
ad
2
+
species on the Co metal surface is observed for both the systems. The oxides/hydroxides formed on the Co surface on the addition of oxalic acid to H
2
O
2
are higher than using only H
2
O
2
, thus properly justifying the role of a complexing agent in a CMP slurry. Products formed on exposure of Co to H
2
O
2
and H
2
O
2
-oxalic acid solution at pH 9 are analyzed using X-ray photoelectron spectroscopy (XPS) analysis. The results confirm the formation and dominance of Co-oxalate complexes in H
2
O
2
—oxalic acid system.
Graphical abstract |
| doi_str_mv | 10.1007/s10008-023-05379-z |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2786550867</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2786550867</sourcerecordid><originalsourceid>FETCH-LOGICAL-c319t-283d8a9cd1412433ee1cbd172edce056c3add677cc1ec5a03c97b5dbf8942dfc3</originalsourceid><addsrcrecordid>eNp9kc1O4zAUhSM0SDDAC7CyxGZYBOy4iZ3ZoYo_CYkNrC3n-qZ1SeyMnUoNb8Ub4raD2LHx73eOj3yy7JzRK0apuI5ppDKnBc9pyUWdvx9kx2zG01ZU8tduXeRyJuVR9jvGFaVMVIweZx-3bYswEt8Sv9GdBaLBGvIHfD90uLFuQfQC3XhJvCPaeZMIY2P03Xq06Sjp5r7R3UisI8vJBJ9oMmDwG2uQfHHxL-kRltrZ2CcbQ96sw3H7mtPdFG0kzUSwS0mChyX2FnRHbD-g0Q6SzbC7ieCH6TQ7bHUX8ez_fJK93t2-zB_yp-f7x_nNUw6c1WNeSG6krsGwGSvSRyAyaAwTBRpAWlbAtTGVEAAModSUQy2a0jStrGeFaYGfZBd73yH4f2uMo1r5dUhxoyqErMqSykokqthTkOLFgK0agu11mBSjaluN2lejUjVqV416TyK-F8UEuwWGb-sfVJ8N_JfA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2786550867</pqid></control><display><type>article</type><title>Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy</title><source>Springer Nature - Complete Springer Journals</source><creator>Hazarika, Jenasree ; Talukdar, Anusuya ; Rajaraman, Prasanna Venkatesh</creator><creatorcontrib>Hazarika, Jenasree ; Talukdar, Anusuya ; Rajaraman, Prasanna Venkatesh</creatorcontrib><description>The anodic dissolution of Cobalt in H
2
O
2
solution is investigated in the presence and absence of a complexing agent, oxalic acid, using various techniques including electrochemical impedance spectroscopy (EIS). Anodic polarization measurements of both the solutions show that active dissolution occurs in the potential range of 0 to 600 mV w.r.t open circuit potential (OCP) and the addition of oxalic acid enhances the dissolution of Co by forming highly soluble Cobalt complexes. The mechanistic reaction pathway of Co dissolution at metal-solution interface is investigated by performing EIS measurements at various overpotentials under anodic conditions. EIS spectra exhibit two loops; capacitance (higher frequency) followed by inductance (lower frequency) at all the overpotentials and it was modeled by a multi-step mechanism with 3 intermediate adsorbed species. The dissolution via both chemical and electrochemical steps is considered in the proposed model. From the parameters obtained, dominance of
C
o
ad
2
+
species on the Co metal surface is observed for both the systems. The oxides/hydroxides formed on the Co surface on the addition of oxalic acid to H
2
O
2
are higher than using only H
2
O
2
, thus properly justifying the role of a complexing agent in a CMP slurry. Products formed on exposure of Co to H
2
O
2
and H
2
O
2
-oxalic acid solution at pH 9 are analyzed using X-ray photoelectron spectroscopy (XPS) analysis. The results confirm the formation and dominance of Co-oxalate complexes in H
2
O
2
—oxalic acid system.
Graphical abstract</description><identifier>ISSN: 1432-8488</identifier><identifier>EISSN: 1433-0768</identifier><identifier>DOI: 10.1007/s10008-023-05379-z</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer Berlin Heidelberg</publisher><subject>Acids ; Analytical Chemistry ; Anodic dissolution ; Anodic polarization ; Characterization and Evaluation of Materials ; Chemistry ; Chemistry and Materials Science ; Cobalt compounds ; Condensed Matter Physics ; Dissolution ; Electrochemical impedance spectroscopy ; Electrochemistry ; Electrode polarization ; Energy Storage ; Hydrogen peroxide ; Hydroxides ; Inductance ; Metal surfaces ; Open circuit voltage ; Original Paper ; Oxalic acid ; Photoelectrons ; Physical Chemistry ; Spectroscopic analysis ; Spectrum analysis ; X ray photoelectron spectroscopy</subject><ispartof>Journal of solid state electrochemistry, 2023-04, Vol.27 (4), p.895-909</ispartof><rights>The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-283d8a9cd1412433ee1cbd172edce056c3add677cc1ec5a03c97b5dbf8942dfc3</citedby><cites>FETCH-LOGICAL-c319t-283d8a9cd1412433ee1cbd172edce056c3add677cc1ec5a03c97b5dbf8942dfc3</cites><orcidid>0000-0003-4510-018X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s10008-023-05379-z$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s10008-023-05379-z$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,777,781,27905,27906,41469,42538,51300</link.rule.ids></links><search><creatorcontrib>Hazarika, Jenasree</creatorcontrib><creatorcontrib>Talukdar, Anusuya</creatorcontrib><creatorcontrib>Rajaraman, Prasanna Venkatesh</creatorcontrib><title>Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy</title><title>Journal of solid state electrochemistry</title><addtitle>J Solid State Electrochem</addtitle><description>The anodic dissolution of Cobalt in H
2
O
2
solution is investigated in the presence and absence of a complexing agent, oxalic acid, using various techniques including electrochemical impedance spectroscopy (EIS). Anodic polarization measurements of both the solutions show that active dissolution occurs in the potential range of 0 to 600 mV w.r.t open circuit potential (OCP) and the addition of oxalic acid enhances the dissolution of Co by forming highly soluble Cobalt complexes. The mechanistic reaction pathway of Co dissolution at metal-solution interface is investigated by performing EIS measurements at various overpotentials under anodic conditions. EIS spectra exhibit two loops; capacitance (higher frequency) followed by inductance (lower frequency) at all the overpotentials and it was modeled by a multi-step mechanism with 3 intermediate adsorbed species. The dissolution via both chemical and electrochemical steps is considered in the proposed model. From the parameters obtained, dominance of
C
o
ad
2
+
species on the Co metal surface is observed for both the systems. The oxides/hydroxides formed on the Co surface on the addition of oxalic acid to H
2
O
2
are higher than using only H
2
O
2
, thus properly justifying the role of a complexing agent in a CMP slurry. Products formed on exposure of Co to H
2
O
2
and H
2
O
2
-oxalic acid solution at pH 9 are analyzed using X-ray photoelectron spectroscopy (XPS) analysis. The results confirm the formation and dominance of Co-oxalate complexes in H
2
O
2
—oxalic acid system.
Graphical abstract</description><subject>Acids</subject><subject>Analytical Chemistry</subject><subject>Anodic dissolution</subject><subject>Anodic polarization</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Cobalt compounds</subject><subject>Condensed Matter Physics</subject><subject>Dissolution</subject><subject>Electrochemical impedance spectroscopy</subject><subject>Electrochemistry</subject><subject>Electrode polarization</subject><subject>Energy Storage</subject><subject>Hydrogen peroxide</subject><subject>Hydroxides</subject><subject>Inductance</subject><subject>Metal surfaces</subject><subject>Open circuit voltage</subject><subject>Original Paper</subject><subject>Oxalic acid</subject><subject>Photoelectrons</subject><subject>Physical Chemistry</subject><subject>Spectroscopic analysis</subject><subject>Spectrum analysis</subject><subject>X ray photoelectron spectroscopy</subject><issn>1432-8488</issn><issn>1433-0768</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNp9kc1O4zAUhSM0SDDAC7CyxGZYBOy4iZ3ZoYo_CYkNrC3n-qZ1SeyMnUoNb8Ub4raD2LHx73eOj3yy7JzRK0apuI5ppDKnBc9pyUWdvx9kx2zG01ZU8tduXeRyJuVR9jvGFaVMVIweZx-3bYswEt8Sv9GdBaLBGvIHfD90uLFuQfQC3XhJvCPaeZMIY2P03Xq06Sjp5r7R3UisI8vJBJ9oMmDwG2uQfHHxL-kRltrZ2CcbQ96sw3H7mtPdFG0kzUSwS0mChyX2FnRHbD-g0Q6SzbC7ieCH6TQ7bHUX8ez_fJK93t2-zB_yp-f7x_nNUw6c1WNeSG6krsGwGSvSRyAyaAwTBRpAWlbAtTGVEAAModSUQy2a0jStrGeFaYGfZBd73yH4f2uMo1r5dUhxoyqErMqSykokqthTkOLFgK0agu11mBSjaluN2lejUjVqV416TyK-F8UEuwWGb-sfVJ8N_JfA</recordid><startdate>20230401</startdate><enddate>20230401</enddate><creator>Hazarika, Jenasree</creator><creator>Talukdar, Anusuya</creator><creator>Rajaraman, Prasanna Venkatesh</creator><general>Springer Berlin Heidelberg</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0003-4510-018X</orcidid></search><sort><creationdate>20230401</creationdate><title>Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy</title><author>Hazarika, Jenasree ; Talukdar, Anusuya ; Rajaraman, Prasanna Venkatesh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-283d8a9cd1412433ee1cbd172edce056c3add677cc1ec5a03c97b5dbf8942dfc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Acids</topic><topic>Analytical Chemistry</topic><topic>Anodic dissolution</topic><topic>Anodic polarization</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Cobalt compounds</topic><topic>Condensed Matter Physics</topic><topic>Dissolution</topic><topic>Electrochemical impedance spectroscopy</topic><topic>Electrochemistry</topic><topic>Electrode polarization</topic><topic>Energy Storage</topic><topic>Hydrogen peroxide</topic><topic>Hydroxides</topic><topic>Inductance</topic><topic>Metal surfaces</topic><topic>Open circuit voltage</topic><topic>Original Paper</topic><topic>Oxalic acid</topic><topic>Photoelectrons</topic><topic>Physical Chemistry</topic><topic>Spectroscopic analysis</topic><topic>Spectrum analysis</topic><topic>X ray photoelectron spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hazarika, Jenasree</creatorcontrib><creatorcontrib>Talukdar, Anusuya</creatorcontrib><creatorcontrib>Rajaraman, Prasanna Venkatesh</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of solid state electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hazarika, Jenasree</au><au>Talukdar, Anusuya</au><au>Rajaraman, Prasanna Venkatesh</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy</atitle><jtitle>Journal of solid state electrochemistry</jtitle><stitle>J Solid State Electrochem</stitle><date>2023-04-01</date><risdate>2023</risdate><volume>27</volume><issue>4</issue><spage>895</spage><epage>909</epage><pages>895-909</pages><issn>1432-8488</issn><eissn>1433-0768</eissn><abstract>The anodic dissolution of Cobalt in H
2
O
2
solution is investigated in the presence and absence of a complexing agent, oxalic acid, using various techniques including electrochemical impedance spectroscopy (EIS). Anodic polarization measurements of both the solutions show that active dissolution occurs in the potential range of 0 to 600 mV w.r.t open circuit potential (OCP) and the addition of oxalic acid enhances the dissolution of Co by forming highly soluble Cobalt complexes. The mechanistic reaction pathway of Co dissolution at metal-solution interface is investigated by performing EIS measurements at various overpotentials under anodic conditions. EIS spectra exhibit two loops; capacitance (higher frequency) followed by inductance (lower frequency) at all the overpotentials and it was modeled by a multi-step mechanism with 3 intermediate adsorbed species. The dissolution via both chemical and electrochemical steps is considered in the proposed model. From the parameters obtained, dominance of
C
o
ad
2
+
species on the Co metal surface is observed for both the systems. The oxides/hydroxides formed on the Co surface on the addition of oxalic acid to H
2
O
2
are higher than using only H
2
O
2
, thus properly justifying the role of a complexing agent in a CMP slurry. Products formed on exposure of Co to H
2
O
2
and H
2
O
2
-oxalic acid solution at pH 9 are analyzed using X-ray photoelectron spectroscopy (XPS) analysis. The results confirm the formation and dominance of Co-oxalate complexes in H
2
O
2
—oxalic acid system.
Graphical abstract</abstract><cop>Berlin/Heidelberg</cop><pub>Springer Berlin Heidelberg</pub><doi>10.1007/s10008-023-05379-z</doi><tpages>15</tpages><orcidid>https://orcid.org/0000-0003-4510-018X</orcidid></addata></record> |
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| subjects | Acids Analytical Chemistry Anodic dissolution Anodic polarization Characterization and Evaluation of Materials Chemistry Chemistry and Materials Science Cobalt compounds Condensed Matter Physics Dissolution Electrochemical impedance spectroscopy Electrochemistry Electrode polarization Energy Storage Hydrogen peroxide Hydroxides Inductance Metal surfaces Open circuit voltage Original Paper Oxalic acid Photoelectrons Physical Chemistry Spectroscopic analysis Spectrum analysis X ray photoelectron spectroscopy |
| title | Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy |
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