The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection
The prime objective of the current research was to analyze and utilize the coexistence of basic and acidic metal oxide semiconductors (MOS) for sensing pollutant gases. In the current work, 1 wt.%, 3 wt.%, 5 wt.%, 7 wt.%, and 9 wt.% NiO (basic MOS) was added to MoO 3 (acidic MOS), and thick films we...
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| description | The prime objective of the current research was to analyze and utilize the coexistence of basic and acidic metal oxide semiconductors (MOS) for sensing pollutant gases. In the current work, 1 wt.%, 3 wt.%, 5 wt.%, 7 wt.%, and 9 wt.% NiO (basic MOS) was added to MoO
3
(acidic MOS), and thick films were prepared using the screen printing technique. Structural characterization was performed by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive x-ray analysis (EDAX). The crystallite size was about 50 nm, with intermediate voids. EDAX analysis confirmed the non-stoichiometric composition of the films. The films were oxygen-deficient as per EDAX data. An electrical analysis involving resistivity, temperature coefficient of resistance (TCR), and activation energy was also performed. NiO3 samples showed maximum resistivity of 103.13 × 10
4
Ω·m and minimum activation energy of 0.3953 eV. The electrical analysis predicted the distinct behavior of the NiO3 sample. A negative TCR value indicated the semiconductor-like behavior of the samples. The pollutant gas response of the samples was analyzed using a static gas sensing apparatus. NiO3 samples showed gas sensitivity of 87% towards the ethanol vapors, with good selectivity, as compared with the responses towards CO, liquid petroleum gas (LPG), NH
3
, and NO
2
gases. The oxygen vacancy-based gas sensing mechanism was the probable reason for the improved ethanol vapor sensing. The response time of the sample was 28 s, while the recovery time was 38 s.
Graphical Abstract |
| doi_str_mv | 10.1007/s11664-022-10130-x |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2773996403</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2773996403</sourcerecordid><originalsourceid>FETCH-LOGICAL-c200t-a7587eed53360982a9810a1e5b80a26e97731f218a2ba70b098f55415f814e43</originalsourceid><addsrcrecordid>eNp9kLFOwzAURS0EEqXwA0yWWOgQeM-OE2dEBQpS2zBkYDNO6kBKGhc7kdq_JyVIbEwe3jnX0iHkEuEGAeJbjxhFYQCMBQjIIdgdkRGKkAcoo9djMgIeYSAYF6fkzPs1AAqUOCJv2YehU7vJq0a3lW2oLemyKj5NTdNdtTL0elmlE6qbFV3Yep-vTNNtaOYqO1wXNuUTWlpHX2xdd61uWjrTnt6b1hSHwXNyUuram4vfd0yyx4ds-hTM09nz9G4eFAygDXQsZGzMSnAeQSKZTiSCRiNyCZpFJoljjiVDqVmuY8h7phQiRFFKDE3Ix-RqmN06-9UZ36q17VzT_6hYryZJFALvKTZQhbPeO1Oqras22u0VgjqEVENI1YdUPyHVrpf4IPkebt6N-5v-x_oGWaN0Aw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2773996403</pqid></control><display><type>article</type><title>The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection</title><source>SpringerLink Journals - AutoHoldings</source><creator>Halwar, Dharma K. ; Deshmane, Vikas V. ; Patil, Arun V.</creator><creatorcontrib>Halwar, Dharma K. ; Deshmane, Vikas V. ; Patil, Arun V.</creatorcontrib><description>The prime objective of the current research was to analyze and utilize the coexistence of basic and acidic metal oxide semiconductors (MOS) for sensing pollutant gases. In the current work, 1 wt.%, 3 wt.%, 5 wt.%, 7 wt.%, and 9 wt.% NiO (basic MOS) was added to MoO
3
(acidic MOS), and thick films were prepared using the screen printing technique. Structural characterization was performed by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive x-ray analysis (EDAX). The crystallite size was about 50 nm, with intermediate voids. EDAX analysis confirmed the non-stoichiometric composition of the films. The films were oxygen-deficient as per EDAX data. An electrical analysis involving resistivity, temperature coefficient of resistance (TCR), and activation energy was also performed. NiO3 samples showed maximum resistivity of 103.13 × 10
4
Ω·m and minimum activation energy of 0.3953 eV. The electrical analysis predicted the distinct behavior of the NiO3 sample. A negative TCR value indicated the semiconductor-like behavior of the samples. The pollutant gas response of the samples was analyzed using a static gas sensing apparatus. NiO3 samples showed gas sensitivity of 87% towards the ethanol vapors, with good selectivity, as compared with the responses towards CO, liquid petroleum gas (LPG), NH
3
, and NO
2
gases. The oxygen vacancy-based gas sensing mechanism was the probable reason for the improved ethanol vapor sensing. The response time of the sample was 28 s, while the recovery time was 38 s.
Graphical Abstract</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-022-10130-x</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Acidic oxides ; Activation energy ; Ammonia ; Basic oxides ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Crystallites ; Electrical resistivity ; Electronics and Microelectronics ; Energy dispersive X ray analysis ; Ethanol ; Gas sensors ; Gases ; Instrumentation ; Liquefied petroleum gas ; Materials Science ; Metal oxide semiconductors ; Molybdenum trioxide ; Nickel oxides ; Nitrogen dioxide ; Optical and Electronic Materials ; Original Research Article ; Oxygen ; Pollutants ; Recovery time ; Response time ; Screen printing ; Selectivity ; Solid State Physics ; Structural analysis ; Thick films ; X ray analysis</subject><ispartof>Journal of electronic materials, 2023-03, Vol.52 (3), p.1840-1853</ispartof><rights>The Minerals, Metals & Materials Society 2022. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c200t-a7587eed53360982a9810a1e5b80a26e97731f218a2ba70b098f55415f814e43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11664-022-10130-x$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11664-022-10130-x$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Halwar, Dharma K.</creatorcontrib><creatorcontrib>Deshmane, Vikas V.</creatorcontrib><creatorcontrib>Patil, Arun V.</creatorcontrib><title>The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection</title><title>Journal of electronic materials</title><addtitle>J. Electron. Mater</addtitle><description>The prime objective of the current research was to analyze and utilize the coexistence of basic and acidic metal oxide semiconductors (MOS) for sensing pollutant gases. In the current work, 1 wt.%, 3 wt.%, 5 wt.%, 7 wt.%, and 9 wt.% NiO (basic MOS) was added to MoO
3
(acidic MOS), and thick films were prepared using the screen printing technique. Structural characterization was performed by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive x-ray analysis (EDAX). The crystallite size was about 50 nm, with intermediate voids. EDAX analysis confirmed the non-stoichiometric composition of the films. The films were oxygen-deficient as per EDAX data. An electrical analysis involving resistivity, temperature coefficient of resistance (TCR), and activation energy was also performed. NiO3 samples showed maximum resistivity of 103.13 × 10
4
Ω·m and minimum activation energy of 0.3953 eV. The electrical analysis predicted the distinct behavior of the NiO3 sample. A negative TCR value indicated the semiconductor-like behavior of the samples. The pollutant gas response of the samples was analyzed using a static gas sensing apparatus. NiO3 samples showed gas sensitivity of 87% towards the ethanol vapors, with good selectivity, as compared with the responses towards CO, liquid petroleum gas (LPG), NH
3
, and NO
2
gases. The oxygen vacancy-based gas sensing mechanism was the probable reason for the improved ethanol vapor sensing. The response time of the sample was 28 s, while the recovery time was 38 s.
Graphical Abstract</description><subject>Acidic oxides</subject><subject>Activation energy</subject><subject>Ammonia</subject><subject>Basic oxides</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Crystallites</subject><subject>Electrical resistivity</subject><subject>Electronics and Microelectronics</subject><subject>Energy dispersive X ray analysis</subject><subject>Ethanol</subject><subject>Gas sensors</subject><subject>Gases</subject><subject>Instrumentation</subject><subject>Liquefied petroleum gas</subject><subject>Materials Science</subject><subject>Metal oxide semiconductors</subject><subject>Molybdenum trioxide</subject><subject>Nickel oxides</subject><subject>Nitrogen dioxide</subject><subject>Optical and Electronic Materials</subject><subject>Original Research Article</subject><subject>Oxygen</subject><subject>Pollutants</subject><subject>Recovery time</subject><subject>Response time</subject><subject>Screen printing</subject><subject>Selectivity</subject><subject>Solid State Physics</subject><subject>Structural analysis</subject><subject>Thick films</subject><subject>X ray analysis</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>8G5</sourceid><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><sourceid>GUQSH</sourceid><sourceid>M2O</sourceid><recordid>eNp9kLFOwzAURS0EEqXwA0yWWOgQeM-OE2dEBQpS2zBkYDNO6kBKGhc7kdq_JyVIbEwe3jnX0iHkEuEGAeJbjxhFYQCMBQjIIdgdkRGKkAcoo9djMgIeYSAYF6fkzPs1AAqUOCJv2YehU7vJq0a3lW2oLemyKj5NTdNdtTL0elmlE6qbFV3Yep-vTNNtaOYqO1wXNuUTWlpHX2xdd61uWjrTnt6b1hSHwXNyUuram4vfd0yyx4ds-hTM09nz9G4eFAygDXQsZGzMSnAeQSKZTiSCRiNyCZpFJoljjiVDqVmuY8h7phQiRFFKDE3Ix-RqmN06-9UZ36q17VzT_6hYryZJFALvKTZQhbPeO1Oqras22u0VgjqEVENI1YdUPyHVrpf4IPkebt6N-5v-x_oGWaN0Aw</recordid><startdate>20230301</startdate><enddate>20230301</enddate><creator>Halwar, Dharma K.</creator><creator>Deshmane, Vikas V.</creator><creator>Patil, Arun V.</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope></search><sort><creationdate>20230301</creationdate><title>The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection</title><author>Halwar, Dharma K. ; Deshmane, Vikas V. ; Patil, Arun V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c200t-a7587eed53360982a9810a1e5b80a26e97731f218a2ba70b098f55415f814e43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Acidic oxides</topic><topic>Activation energy</topic><topic>Ammonia</topic><topic>Basic oxides</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry and Materials Science</topic><topic>Crystallites</topic><topic>Electrical resistivity</topic><topic>Electronics and Microelectronics</topic><topic>Energy dispersive X ray analysis</topic><topic>Ethanol</topic><topic>Gas sensors</topic><topic>Gases</topic><topic>Instrumentation</topic><topic>Liquefied petroleum gas</topic><topic>Materials Science</topic><topic>Metal oxide semiconductors</topic><topic>Molybdenum trioxide</topic><topic>Nickel oxides</topic><topic>Nitrogen dioxide</topic><topic>Optical and Electronic Materials</topic><topic>Original Research Article</topic><topic>Oxygen</topic><topic>Pollutants</topic><topic>Recovery time</topic><topic>Response time</topic><topic>Screen printing</topic><topic>Selectivity</topic><topic>Solid State Physics</topic><topic>Structural analysis</topic><topic>Thick films</topic><topic>X ray analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Halwar, Dharma K.</creatorcontrib><creatorcontrib>Deshmane, Vikas V.</creatorcontrib><creatorcontrib>Patil, Arun V.</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Science Database (Alumni Edition)</collection><collection>STEM Database</collection><collection>ProQuest Pharma Collection</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Research Library (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>Advanced Technologies & Aerospace Collection</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>Research Library Prep</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>Research Library</collection><collection>Science Database</collection><collection>Engineering Database</collection><collection>Research Library (Corporate)</collection><collection>Advanced Technologies & Aerospace Database</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><collection>ProQuest Central Basic</collection><collection>SIRS Editorial</collection><jtitle>Journal of electronic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Halwar, Dharma K.</au><au>Deshmane, Vikas V.</au><au>Patil, Arun V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection</atitle><jtitle>Journal of electronic materials</jtitle><stitle>J. Electron. Mater</stitle><date>2023-03-01</date><risdate>2023</risdate><volume>52</volume><issue>3</issue><spage>1840</spage><epage>1853</epage><pages>1840-1853</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><abstract>The prime objective of the current research was to analyze and utilize the coexistence of basic and acidic metal oxide semiconductors (MOS) for sensing pollutant gases. In the current work, 1 wt.%, 3 wt.%, 5 wt.%, 7 wt.%, and 9 wt.% NiO (basic MOS) was added to MoO
3
(acidic MOS), and thick films were prepared using the screen printing technique. Structural characterization was performed by x-ray diffraction (XRD), scanning electron microscopy (SEM), and energy-dispersive x-ray analysis (EDAX). The crystallite size was about 50 nm, with intermediate voids. EDAX analysis confirmed the non-stoichiometric composition of the films. The films were oxygen-deficient as per EDAX data. An electrical analysis involving resistivity, temperature coefficient of resistance (TCR), and activation energy was also performed. NiO3 samples showed maximum resistivity of 103.13 × 10
4
Ω·m and minimum activation energy of 0.3953 eV. The electrical analysis predicted the distinct behavior of the NiO3 sample. A negative TCR value indicated the semiconductor-like behavior of the samples. The pollutant gas response of the samples was analyzed using a static gas sensing apparatus. NiO3 samples showed gas sensitivity of 87% towards the ethanol vapors, with good selectivity, as compared with the responses towards CO, liquid petroleum gas (LPG), NH
3
, and NO
2
gases. The oxygen vacancy-based gas sensing mechanism was the probable reason for the improved ethanol vapor sensing. The response time of the sample was 28 s, while the recovery time was 38 s.
Graphical Abstract</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11664-022-10130-x</doi><tpages>14</tpages></addata></record> |
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| subjects | Acidic oxides Activation energy Ammonia Basic oxides Characterization and Evaluation of Materials Chemistry and Materials Science Crystallites Electrical resistivity Electronics and Microelectronics Energy dispersive X ray analysis Ethanol Gas sensors Gases Instrumentation Liquefied petroleum gas Materials Science Metal oxide semiconductors Molybdenum trioxide Nickel oxides Nitrogen dioxide Optical and Electronic Materials Original Research Article Oxygen Pollutants Recovery time Response time Screen printing Selectivity Solid State Physics Structural analysis Thick films X ray analysis |
| title | The Combination of Nickel Oxide (NiO) and Molybdenum Trioxide (MoO3) for Pollutant Gas Detection |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T03%3A18%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20Combination%20of%20Nickel%20Oxide%20(NiO)%20and%20Molybdenum%20Trioxide%20(MoO3)%20for%20Pollutant%20Gas%20Detection&rft.jtitle=Journal%20of%20electronic%20materials&rft.au=Halwar,%20Dharma%20K.&rft.date=2023-03-01&rft.volume=52&rft.issue=3&rft.spage=1840&rft.epage=1853&rft.pages=1840-1853&rft.issn=0361-5235&rft.eissn=1543-186X&rft_id=info:doi/10.1007/s11664-022-10130-x&rft_dat=%3Cproquest_cross%3E2773996403%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2773996403&rft_id=info:pmid/&rfr_iscdi=true |