Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography
A novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The therm...
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| Veröffentlicht in: | Chemical research in Chinese universities 2023-02, Vol.39 (1), p.139-143 |
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| creator | Hu, Shengwen Chen, Jinping Yu, Tianjun Zeng, Yi Yang, Guoqiang Li, Yi |
| description | A
novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal analysis of AD-15 indicates that no apparent glass transition temperature(
T
g
) is observed before the thermal decomposition temperature(
T
d
=160 °C). The good thermal resistance suggests that it can satisfy the lithographic process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithography(EBL). By optimizing the lithographic process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 µC/cm
2
, respectively. Compared with the commercial PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of molecular glass resist with high resolution and sensitivity for EBL. |
| doi_str_mv | 10.1007/s40242-022-2163-1 |
| format | Article |
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novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal analysis of AD-15 indicates that no apparent glass transition temperature(
T
g
) is observed before the thermal decomposition temperature(
T
d
=160 °C). The good thermal resistance suggests that it can satisfy the lithographic process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithography(EBL). By optimizing the lithographic process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 µC/cm
2
, respectively. Compared with the commercial PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of molecular glass resist with high resolution and sensitivity for EBL.</description><identifier>ISSN: 1005-9040</identifier><identifier>EISSN: 2210-3171</identifier><identifier>DOI: 10.1007/s40242-022-2163-1</identifier><language>eng</language><publisher>Changchun: Jilin University and The Editorial Department of Chemical Research in Chinese Universities</publisher><subject>Analytical Chemistry ; Chemistry ; Chemistry and Materials Science ; Chemistry/Food Science ; Electron beam lithography ; Glass transition temperature ; Inorganic Chemistry ; Organic Chemistry ; Photoresists ; Physical Chemistry ; Process parameters ; Room temperature ; Sensitivity ; Spin coating ; Thermal analysis ; Thermal decomposition ; Thermal resistance ; Thickness</subject><ispartof>Chemical research in Chinese universities, 2023-02, Vol.39 (1), p.139-143</ispartof><rights>Jilin University, The Editorial Department of Chemical Research in Chinese Universities and Springer-Verlag GmbH 2022</rights><rights>Jilin University, The Editorial Department of Chemical Research in Chinese Universities and Springer-Verlag GmbH 2022.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-1da2956b7f51d95d4be1e369fc46851384b291336a25ee6a32599057ab2b2f903</citedby><cites>FETCH-LOGICAL-c316t-1da2956b7f51d95d4be1e369fc46851384b291336a25ee6a32599057ab2b2f903</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s40242-022-2163-1$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s40242-022-2163-1$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,778,782,27911,27912,41475,42544,51306</link.rule.ids></links><search><creatorcontrib>Hu, Shengwen</creatorcontrib><creatorcontrib>Chen, Jinping</creatorcontrib><creatorcontrib>Yu, Tianjun</creatorcontrib><creatorcontrib>Zeng, Yi</creatorcontrib><creatorcontrib>Yang, Guoqiang</creatorcontrib><creatorcontrib>Li, Yi</creatorcontrib><title>Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography</title><title>Chemical research in Chinese universities</title><addtitle>Chem. Res. Chin. Univ</addtitle><description>A
novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal analysis of AD-15 indicates that no apparent glass transition temperature(
T
g
) is observed before the thermal decomposition temperature(
T
d
=160 °C). The good thermal resistance suggests that it can satisfy the lithographic process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithography(EBL). By optimizing the lithographic process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 µC/cm
2
, respectively. Compared with the commercial PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of molecular glass resist with high resolution and sensitivity for EBL.</description><subject>Analytical Chemistry</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Chemistry/Food Science</subject><subject>Electron beam lithography</subject><subject>Glass transition temperature</subject><subject>Inorganic Chemistry</subject><subject>Organic Chemistry</subject><subject>Photoresists</subject><subject>Physical Chemistry</subject><subject>Process parameters</subject><subject>Room temperature</subject><subject>Sensitivity</subject><subject>Spin coating</subject><subject>Thermal analysis</subject><subject>Thermal decomposition</subject><subject>Thermal resistance</subject><subject>Thickness</subject><issn>1005-9040</issn><issn>2210-3171</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LAzEQhoMoWKs_wFvAczSTbLLNsa21ChVB9CaE7G7SpuyXyfbQf2_KCp48DTM87zvwIHQL9B4ozR9iRlnGCGWMMJCcwBmaMAaUcMjhHE0SJIiiGb1EVzHuKeVKymyCvpY72_jS1PURz5u-9s7bCr_b6OOAFyampWvxo22r4Adf4teutuWhNgGvaxMjdl3Aq3QaQsIW1jR444ddtw2m3x2v0YUzdbQ3v3OKPp9WH8tnsnlbvyznG1JykAOByjAlZJE7AZUSVVZYsFwqV2ZyJoDPsoIp4FwaJqyVhjOhFBW5KVjBnKJ8iu7G3j503wcbB73vDqFNLzXLZS6kShYSBSNVhi7GYJ3ug29MOGqg-iRRjxJ1kqhPEjWkDBszMbHt1oa_5v9DP_Cpc0k</recordid><startdate>20230201</startdate><enddate>20230201</enddate><creator>Hu, Shengwen</creator><creator>Chen, Jinping</creator><creator>Yu, Tianjun</creator><creator>Zeng, Yi</creator><creator>Yang, Guoqiang</creator><creator>Li, Yi</creator><general>Jilin University and The Editorial Department of Chemical Research in Chinese Universities</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20230201</creationdate><title>Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography</title><author>Hu, Shengwen ; Chen, Jinping ; Yu, Tianjun ; Zeng, Yi ; Yang, Guoqiang ; Li, Yi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-1da2956b7f51d95d4be1e369fc46851384b291336a25ee6a32599057ab2b2f903</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Analytical Chemistry</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Chemistry/Food Science</topic><topic>Electron beam lithography</topic><topic>Glass transition temperature</topic><topic>Inorganic Chemistry</topic><topic>Organic Chemistry</topic><topic>Photoresists</topic><topic>Physical Chemistry</topic><topic>Process parameters</topic><topic>Room temperature</topic><topic>Sensitivity</topic><topic>Spin coating</topic><topic>Thermal analysis</topic><topic>Thermal decomposition</topic><topic>Thermal resistance</topic><topic>Thickness</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hu, Shengwen</creatorcontrib><creatorcontrib>Chen, Jinping</creatorcontrib><creatorcontrib>Yu, Tianjun</creatorcontrib><creatorcontrib>Zeng, Yi</creatorcontrib><creatorcontrib>Yang, Guoqiang</creatorcontrib><creatorcontrib>Li, Yi</creatorcontrib><collection>CrossRef</collection><jtitle>Chemical research in Chinese universities</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hu, Shengwen</au><au>Chen, Jinping</au><au>Yu, Tianjun</au><au>Zeng, Yi</au><au>Yang, Guoqiang</au><au>Li, Yi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography</atitle><jtitle>Chemical research in Chinese universities</jtitle><stitle>Chem. Res. Chin. Univ</stitle><date>2023-02-01</date><risdate>2023</risdate><volume>39</volume><issue>1</issue><spage>139</spage><epage>143</epage><pages>139-143</pages><issn>1005-9040</issn><eissn>2210-3171</eissn><abstract>A
novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal analysis of AD-15 indicates that no apparent glass transition temperature(
T
g
) is observed before the thermal decomposition temperature(
T
d
=160 °C). The good thermal resistance suggests that it can satisfy the lithographic process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithography(EBL). By optimizing the lithographic process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 µC/cm
2
, respectively. Compared with the commercial PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of molecular glass resist with high resolution and sensitivity for EBL.</abstract><cop>Changchun</cop><pub>Jilin University and The Editorial Department of Chemical Research in Chinese Universities</pub><doi>10.1007/s40242-022-2163-1</doi><tpages>5</tpages></addata></record> |
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| subjects | Analytical Chemistry Chemistry Chemistry and Materials Science Chemistry/Food Science Electron beam lithography Glass transition temperature Inorganic Chemistry Organic Chemistry Photoresists Physical Chemistry Process parameters Room temperature Sensitivity Spin coating Thermal analysis Thermal decomposition Thermal resistance Thickness |
| title | Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography |
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