Measurement of the Ellipsometric Parameters of Thin Graphene Layers in the Extreme Ultraviolet

A reflection polarimeter for the XUV (30 – 100 eV) spectral range realized with three ruthenium optics has been designed, developed and tested. The instrument is conceived to be an insertable device, maintaining unaltered the XUV beam propagation direction. For energies greater than ∼55 eV, rutheniu...

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Veröffentlicht in:	Journal of physics. Conference series 2022-12, Vol.2380 (1), p.12079
Hauptverfasser:	Zuppella, P, Samparisi, F, Frassetto, F, Rigato, V, Campostrini, M, Poletto, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Beams (radiation) Ellipsometry Graphene Optical properties Physics Ruthenium Thin films Ultraviolet reflection
Online-Zugang:	Volltext
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